Instability of liquid Cu films on a SiO2 substrate
; Diez, Javier Alberto
; Wu, Yueying ; Fowlkes, Jason D. ; Rack, Philip D. ; Kondic, Lou Otros responsables
Fecha
06/2013
Editorial
American Chemical Society
Revista
Langmuir
Título del libro
Nombre del evento
Fecha del evento
Institución organizadora
ISSN
0743-7463
eISSN
ISBN
Idioma
Inglés
Tipo del evento
Clasificación temática
Palabras clave
Resumen
We study the instability of nanometric Cu thin films on SiO2 substrates. The metal is melted by means of laser pulses for some tens of nanoseconds, and during the liquid lifetime, the free surface destabilizes, leading to the formation of holes at first and then in later stages of the instability to metal drops on the substrate. By analyzing the Fourier transforms of the SEM (scanning electron microscope) images obtained at different stages of the metal film evolution, we determine the emerging length scales at relevant stages of the instability development. The results are then discussed within the framework of a long-wave model. We find that the results may differ whether early or final stages of the instability are considered. On the basis of the interpretation of the experimental results, we discuss the influence of the parameters describing the interaction of the liquid metal with the solid substrate. By considering both the dependence of dominant length scales on the film thickness and the measured contact angle, we isolate a model which predicts well the trends found in the experimental data.
Colecciones
Aprobación
Revisión
Complementado por
Referenciado por
Licencia Creative Commons
Excepto donde se indique lo contrario, la licencia de este ítem se describe como by-nc-sa
