Artículo

Competition kinetics using the UV/H2O2 process: a structure reactivity correlation for the rate constants of hydroxyl radicals toward nitroaromatic compounds

Garcia Einschlag, Fernando Sebastian Icon; Carlos, Luciano Icon; Capparelli, Alberto Luis Icon

Otros responsables

Fecha

12/2003

Editorial

Pergamon-Elsevier Science Ltd.

Revista

Chemosphere

Título del libro

Nombre del evento

Fecha del evento

Institución organizadora

ISSN

0045-6535

eISSN

ISBN

Idioma

Inglés

Tipo del evento

Clasificación temática

Resumen

The rate constants for hydroxyl radical reaction toward a set of nitroaromatic substrates kS, have been measured at 25ºC using competition experiments in the UV/H2O2 process. For a given pair of substrates S1 and S2, the relative reactivity beta(defined as kS1/kS2) was calculated from the slope of the corresponding double logarithmic plot, i.e., of ln[S1] vs. Ln[S2]. This method is more accurate and remained linear for larger conversions in comparison with the plots of ln[S1] and ln[S2] against time. The rate constants measured ranged from 0.33 to 8.6 10<sup>9</sup> M-1 s-1. A quantitative structure–reactivity relationship was found using the Hammett equation. Assuming sigma values to be additive, a value of -0.60 was obtained for the reaction constant rho. This value agrees with the high reactivity and the electrophilic nature of HO•.radical.

Aprobación

Revisión

Complementado por

Referenciado por

Licencia Creative Commons

Excepto donde se indique lo contrario, la licencia de este ítem se describe como by-nc-sa