Investigation of the gas-phase structure and rotational barrier of trimethylsilyl trifluoromethanesulfonate and comparison with covalent sulfonates
; Tuttolomondo, María Eugenia ; Varetti, Eduardo Lelio
; Wann, Derek A. ; Robertson, Heather E. ; Rankin, David W. H. ; Ben Altabef, Aida 
Otros responsables
Fecha
12/2010
Editorial
Elsevier Science
Revista
Journal of Molecular Structure
Título del libro
Nombre del evento
Fecha del evento
Institución organizadora
ISSN
0022-2860
eISSN
ISBN
Idioma
Inglés
Tipo del evento
Clasificación temática
Palabras clave
Resumen
The molecular structure of trimethylsilyl trifluoromethanesulfonate, CF3SO2OSi(CH3)3, has been determined in the gas phase from electron-diffraction data supplemented by ab initio (MP2) and DFT calculations using 6-31G(d), 6-311++G(d,p) and 6-311G++(3df,3pd) basis sets. Both experimental and theoretical data indicate that only one gauche conformer is possible by rotating about the O–S bond. The anomeric effect is a fundamental stereoelectronic interaction and presents a profound influence on the electronic geometry. We have investigated the origin of the anomeric effect by means of NBO and AIM analysis. A natural bond orbital analysis showed that the lpp[O bonded to Si)] ? r [C–S] hyperconjugative interaction favors the gauche conformation. In addition, comparison of the structural and stereoelectronic properties of the title molecule with those of silyl trifluoromethanesulfonate and methyl trifluoromethanesulfonate has been carried out.
Colecciones
Aprobación
Revisión
Complementado por
Referenciado por
Licencia Creative Commons
Excepto donde se indique lo contrario, la licencia de este ítem se describe como by-nc-sa
