Electrodeposition of single and duplex layers of ZnO with different morphologies and electrical properties

Abstract

ZnO films have been prepared by electrodeposition from aqueous solutions. Dense, nanostructured and doped samples can be prepared by changing the composition of the electrolytic bath and fine-tuning the electrochemical parameters. Duplex layers can also be produced, with a nanostructured ZnO layer electrodeposited using as substrate a previously prepared dense or In-doped ZnO layer. The films are deposited potentiostatically using conductive glass as the primary substrate. Deposition over various periods of time has been explored in order to achieve the desired thickness. Different combinations of materials have been prepared entirely by electrodeposition, all showing absorption and XRD spectra, as well as morphologies, in good agreement with those reported for similar materials prepared otherwise. After a thermal annealing in air, the optical quality of the ZnO further improves. Thus, the feasibility of electrodepositing one semiconductor using another semiconductor as substrate has been demonstrated.