Artículo
Electron trapping in amorphous Al2O3
Fecha de publicación:
02/2018
Editorial:
American Institute of Physics
Revista:
Journal of Applied Physics
ISSN:
0021-8979
Idioma:
Inglés
Tipo de recurso:
Artículo publicado
Clasificación temática:
Resumen
The electron trapping in MOS capacitors with amorphous Al2O3 as an insulating layer was studied through pulsed capacitance-voltage technique. A positive shift of the voltage value corresponding to a constant capacitance (VC) was observed. The dependences of the voltage instability with the applied bias and the charging time were investigated. Two different contributions could be distinguished: a hysteresis phenomenon observed on each measurement cycle, and a permanent accumulated VC-shift to which each measurement cycle contributes. A physical model based on tunneling transitions between the substrate and defects within the oxide was implemented. From the fitting procedure within the energy range covered in our measurements (1.7-2.7 eV below the conduction band edge), the trap density was found to decrease exponentially with trap energy depth from 3.0 × 1020 cm-3eV-1 to 9.6 × 1018 cm-3eV-1, with a uniform spatial distribution within the first 2 nm from the semiconductor interface for the hysteresis traps.
Palabras clave:
GATE DIELECTRIC
,
Al2O3
,
ELECTRON TRAPS
,
PULSED CV MEASUREMENT
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Articulos(INTECIN)
Articulos de INST.D/TEC.Y CS.DE LA ING."HILARIO FERNANDEZ LONG"
Articulos de INST.D/TEC.Y CS.DE LA ING."HILARIO FERNANDEZ LONG"
Citación
Sambuco Salomone, Lucas Ignacio; Campabadal, F.; Faigon, Adrián Néstor; Electron trapping in amorphous Al2O3; American Institute of Physics; Journal of Applied Physics; 123; 8; 2-2018; 853041-853048
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