Artículo
High resolution X-Ray diffraction analysis of InGaAs/InP superlattices
Fecha de publicación:
12/2006
Editorial:
American Institute of Physics
Revista:
Journal of Applied Physics
ISSN:
0021-8979
Idioma:
Inglés
Tipo de recurso:
Artículo publicado
Clasificación temática:
Resumen
The interfacial properties of lattice-matched InGaAs/InP superlattice (SL) structures grown by gas source molecular beam epitaxy were investigated by high resolution x-ray diffraction (HRXRD). SLs with various periods were grown to determine the contributions of the interface layers to the structural properties of the SLs. The HRXRD curves exhibited a number of features indicative of interfacial layers, including weak even-order satellite peaks, and a zero-order diffraction peak that shifted toward lower diffraction angles with decreasing SL period. A detailed structural model is proposed to explain these observations, consisting of strained InAsP and InGaAsP monolayers due to the group-V gas switching and atomic exchange at the SL interfaces.
Palabras clave:
InGaAs/InP
,
superlattice
,
X-ray diffraction
,
InGaAsP
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Articulos(CCT - NOA SUR)
Articulos de CTRO.CIENTIFICO TECNOL.CONICET - NOA SUR
Articulos de CTRO.CIENTIFICO TECNOL.CONICET - NOA SUR
Citación
Cornet, D. M.; LaPierre, R. R; Pusep, Yu A.; Comedi, David Mario; High resolution X-Ray diffraction analysis of InGaAs/InP superlattices; American Institute of Physics; Journal of Applied Physics; 100; 12-2006; 1-6
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