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dc.contributor.author
Burgi, Juan Mauel
dc.contributor.author
Newenschwander, R.
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Kellermann, G.
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García Molleja, Javier
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Craievich, A.
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Feugeas J.
dc.date.available
2015-06-11T22:10:23Z
dc.date.issued
2013-01
dc.identifier.citation
Burgi, Juan Mauel; Newenschwander, R.; Kellermann, G.; García Molleja, Javier; Craievich, A.; et al.; Reactive sputter magnetron reactor for preparation of thin films and simultaneous in situ structural study by X-ray diffraction; Amer Inst Physics; Review Of Scientific Instruments; 84; 1-2013; 151021-151025
dc.identifier.issn
0034-6748
dc.identifier.uri
http://hdl.handle.net/11336/704
dc.description.abstract
The purpose of the designed reactor is (i) to obtain polycrystalline and/or amorphous thin films by controlled deposition induced by a reactive sputtering magnetron and (ii) to perform a parallel in situ structural study of the deposited thin films by X-ray diffraction, in real time, during the whole growth process. The designed reactor allows for the control and precise variation of the relevant processing parameters, namely, magnetron target-to-sample distance, dc magnetron voltage, and nature of the gas mixture, gas pressure and temperature of the substrate. On the other hand, the chamber can be used in different X-ray diffraction scanning modes, namely, θ-2θ scanning, fixed α-2θ scanning, and also low angle techniques such as grazing incidence small angle X-ray scattering and X-ray reflectivity. The chamber was mounted on a standard four-circle diffractometer located in a synchrotron beam line and first used for a preliminary X-ray diffraction analysis of AlN thin films during their growth on the surface of a (100) silicon wafer. © 2013 American Institute of Physics
dc.format
application/pdf
dc.language.iso
eng
dc.publisher
Amer Inst Physics
dc.rights
info:eu-repo/semantics/openAccess
dc.rights.uri
https://creativecommons.org/licenses/by-nc-nd/2.5/ar/
dc.subject
Aluminium Compounds
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Gas Mixtures
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Iii-V Semiconductors
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Semiconductor Growth
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Semiconductor Thin Film
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Sputter Deposition
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Synchrotrons
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Wide Band Gap Semiconductors
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X-Ray Diffraction
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X-Ray Diffractometers
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X-Ray Reflection
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X-Ray Scattering
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Física de los Fluidos y Plasma
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Ciencias Físicas
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CIENCIAS NATURALES Y EXACTAS
dc.title
Reactive sputter magnetron reactor for preparation of thin films and simultaneous in situ structural study by X-ray diffraction
dc.type
info:eu-repo/semantics/article
dc.type
info:ar-repo/semantics/artículo
dc.type
info:eu-repo/semantics/publishedVersion
dc.date.updated
2016-03-30 10:35:44.97925-03
dc.journal.volume
84
dc.journal.pagination
151021-151025
dc.journal.pais
Estados Unidos
dc.journal.ciudad
New York
dc.description.fil
Fil: Burgi, Juan Mauel. Consejo Nacional de Investigaciones Científicas y Técnicas. Centro Científico Tecnológico - CONICET - Rosario. Instituto de Fisica de Rosario (i); Argentina
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Fil: Newenschwander, R.. Laboratorio Nacional de Luz Sincrotron Campinas;
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Fil: Kellermann, G.. Universidade Federal Do Parana;
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Fil: García Molleja, Javier. Consejo Nacional de Investigaciones Científicas y Técnicas. Centro Científico Tecnológico - CONICET - Rosario. Instituto de Fisica de Rosario (i); Argentina
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Fil: Craievich, A.. Instituto de Fisica Universidad de San Pablo;
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Fil: Feugeas J.. Consejo Nacional de Investigaciones Científicas y Técnicas. Centro Científico Tecnológico - CONICET - Rosario. Instituto de Fisica de Rosario (i); Argentina
dc.journal.title
Review Of Scientific Instruments
dc.relation.alternativeid
info:eu-repo/semantics/altIdentifier/doi/http://dx.doi.org/10.1063/1.4773002
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