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Artículo

Reactive sputter magnetron reactor for preparation of thin films and simultaneous in situ structural study by X-ray diffraction

Burgi, Juan MauelIcon ; Newenschwander, R.; Kellermann, G.; García Molleja, JavierIcon ; Craievich, A.; Feugeas J.
Fecha de publicación: 01/2013
Editorial: Amer Inst Physics
Revista: Review Of Scientific Instruments
ISSN: 0034-6748
Idioma: Inglés
Tipo de recurso: Artículo publicado
Clasificación temática:
Física de los Fluidos y Plasma

Resumen

The purpose of the designed reactor is (i) to obtain polycrystalline and/or amorphous thin films by controlled deposition induced by a reactive sputtering magnetron and (ii) to perform a parallel in situ structural study of the deposited thin films by X-ray diffraction, in real time, during the whole growth process. The designed reactor allows for the control and precise variation of the relevant processing parameters, namely, magnetron target-to-sample distance, dc magnetron voltage, and nature of the gas mixture, gas pressure and temperature of the substrate. On the other hand, the chamber can be used in different X-ray diffraction scanning modes, namely, θ-2θ scanning, fixed α-2θ scanning, and also low angle techniques such as grazing incidence small angle X-ray scattering and X-ray reflectivity. The chamber was mounted on a standard four-circle diffractometer located in a synchrotron beam line and first used for a preliminary X-ray diffraction analysis of AlN thin films during their growth on the surface of a (100) silicon wafer. © 2013 American Institute of Physics
Palabras clave: Aluminium Compounds , Gas Mixtures , Iii-V Semiconductors , Semiconductor Growth , Semiconductor Thin Film , Sputter Deposition , Synchrotrons , Wide Band Gap Semiconductors , X-Ray Diffraction , X-Ray Diffractometers , X-Ray Reflection , X-Ray Scattering
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info:eu-repo/semantics/openAccess Excepto donde se diga explícitamente, este item se publica bajo la siguiente descripción: Atribución-NoComercial-SinDerivadas 2.5 Argentina (CC BY-NC-ND 2.5 AR)
Identificadores
URI: http://hdl.handle.net/11336/704
DOI: http://dx.doi.org/10.1063/1.4773002
Colecciones
Articulos(IFIR)
Articulos de INST.DE FISICA DE ROSARIO (I)
Citación
Burgi, Juan Mauel; Newenschwander, R.; Kellermann, G.; García Molleja, Javier; Craievich, A.; et al.; Reactive sputter magnetron reactor for preparation of thin films and simultaneous in situ structural study by X-ray diffraction; Amer Inst Physics; Review Of Scientific Instruments; 84; 1-2013; 151021-151025
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