Artículo

Dynamics of hillocks formation during wet etching

Suarez, Maria PatriciaIcon ; Mirabella, D. A.; Aldao, Celso ManuelIcon
Fecha de publicación: 19/02/2008
Editorial: Elsevier Science
Revista: Journal of Molecular Catalysis A: Chemical
ISSN: 1381-1169
Idioma: Inglés
Tipo de recurso: Artículo publicado
Clasificación temática:

Resumen

Etch hillocks formation was studied experimentally and modeled using the Monte Carlo method. Simulations were used to explore the consequences of site-dependent detachment probabilities on surface morphology for a one- and two-dimensional substrate models. Comparison with pyramidal etch hillocks that are regularly observed in anisotropic etching of Si(1 0 0) are presented. The steady-state morphologies are analyzed and the hillock size distributions determined. The mechanisms responsible for the steady-state morphologies are described.
Palabras clave: Etching , Monte Carlo Simulations , Roughness And Topography , Scanning Electron Microscopy
 
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info:eu-repo/semantics/openAccess Excepto donde se diga explícitamente, este item se publica bajo la siguiente descripción: Atribución-NoComercial-SinDerivadas 2.5 Argentina (CC BY-NC-ND 2.5 AR)
Identificadores
URI: http://hdl.handle.net/11336/67970
URL: https://www.sciencedirect.com/science/article/pii/S1381116907004918?via%3Dihub
DOI: http://dx.doi.org/10.1016/j.molcata.2007.08.012
Colecciones
Articulos(INTEMA)
Articulos de INST.DE INV.EN CIENCIA Y TECNOL.MATERIALES (I)
Citación
Suarez, Maria Patricia; Mirabella, D. A.; Aldao, Celso Manuel; Dynamics of hillocks formation during wet etching; Elsevier Science; Journal of Molecular Catalysis A: Chemical; 281; 1-2; 19-2-2008; 230-236
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