Artículo
Study of defects in implanted silica glass by depth profiling Positron Annihilation Spectroscopy
Brusa, R. S.; Mariazzi, S.; Ravelli, L.; Mazzoldi, P.; Mattei, G.; Egger, W.; Hugenschmidt, C.; Löwe, B.; Pikart, P.; Macchi, Carlos Eugenio
; Somoza, Alberto Horacio
; Somoza, Alberto Horacio
Fecha de publicación:
10/2010
Editorial:
Elsevier Science
Revista:
Beam Interactions with Materials and Atoms
ISSN:
0168-583X
Idioma:
Inglés
Tipo de recurso:
Artículo publicado
Clasificación temática:
Resumen
Positron Annihilation Spectroscopy (PAS) performed with continuous and pulsed positron beams allows to characterize the size of the intrinsic nano-voids in silica glass, their in depth modification after ion implantation and their decoration by implanted ions. Three complementary PAS techniques, lifetime spectroscopy (LS), Doppler broadening spectroscopy (DBS) and coincidence Doppler broadening spectroscopy (CDBS) will be illustrated by presenting, as a case study, measurements obtained on virgin and gold implanted silica glass.
Palabras clave:
Silica glass
,
Positronium
,
Positrons
,
Ion implantation
Archivos asociados
Tamaño:
716.0Kb
Formato:
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Licencia
Excepto donde se diga explícitamente, este item se publica bajo la siguiente descripción:
Creative Commons Attribution-NonCommercial-ShareAlike 2.5 Unported (CC BY-NC-SA 2.5)
Identificadores
Colecciones
Articulos(CCT - TANDIL)
Articulos de CTRO CIENTIFICO TECNOLOGICO CONICET - TANDIL
Articulos de CTRO CIENTIFICO TECNOLOGICO CONICET - TANDIL
Citación
Brusa, R. S.; Mariazzi, S.; Ravelli, L.; Mazzoldi, P.; Mattei, G.; et al.; Study of defects in implanted silica glass by depth profiling Positron Annihilation Spectroscopy; Elsevier Science; Beam Interactions with Materials and Atoms; 268; 19; 10-2010; 3186-3190
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