Artículo

The Thermal Dissociation-Recombination Reactions of SiF4, SiF3, and SiF2: A Shock Wave and Theoretical Modeling Study

Cobos, Carlos JorgeIcon ; Sölter, Lars; Tellbach, Elsa; Troe, Jürgen
Fecha de publicación: 12/2022
Editorial: American Chemical Society
Revista: Journal of Physical Chemistry A
ISSN: 1089-5639
Idioma: Inglés
Tipo de recurso: Artículo publicado
Clasificación temática:

Resumen

Monitoring UV absorption signals of SiF2and SiF, the thermal dissociation reactions of SiF4and SiF2were studied in shock waves. Rationalizing the experimental observations by standard unimolecular rate theory in combination with quantum-chemical calculations of the reaction potentials, rate constants for the thermal dissociation reactions of SiF4, SiF3, and SiF2and their reverse recombination reactions were determined over broad temperature and pressure ranges. A comparison of fluorosilicon and fluorocarbon chemistry was finally made.
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info:eu-repo/semantics/restrictedAccess Excepto donde se diga explícitamente, este item se publica bajo la siguiente descripción: Creative Commons Attribution-NonCommercial-ShareAlike 2.5 Unported (CC BY-NC-SA 2.5)
Identificadores
URI: http://hdl.handle.net/11336/204885
DOI: http://dx.doi.org/10.1021/acs.jpca.2c06529
URL: https://pubs.acs.org/doi/10.1021/acs.jpca.2c06529
Colecciones
Articulos(INIFTA)
Articulos de INST.DE INV.FISICOQUIMICAS TEORICAS Y APLIC.
Citación
Cobos, Carlos Jorge; Sölter, Lars; Tellbach, Elsa; Troe, Jürgen; The Thermal Dissociation-Recombination Reactions of SiF4, SiF3, and SiF2: A Shock Wave and Theoretical Modeling Study; American Chemical Society; Journal of Physical Chemistry A; 126; 47; 12-2022; 8871-8877
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