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dc.contributor.author
Sturiale, Alejandro Ernesto  
dc.contributor.author
Rubinelli, Francisco Alberto  
dc.date.available
2017-07-06T19:48:15Z  
dc.date.issued
2008-04  
dc.identifier.citation
Sturiale, Alejandro Ernesto; Rubinelli, Francisco Alberto; Evidences of the Defect Pool Model in the dark J-V characteristics of hydrogenated amorphous silicon based p-i-n devices; Elsevier Science Sa; Thin Solid Films; 516; 21; 4-2008; 7708-7714  
dc.identifier.issn
0040-6090  
dc.identifier.uri
http://hdl.handle.net/11336/19802  
dc.description.abstract
In the scientific literature the density of states of hydrogenated amorphous silicon has been assumed to be either uniform or spatially variable inside the intrinsic layer of p-i-n solar cells. The dependence of the dark current voltage characteristics of amorphous silicon based solar cells with respect to the intrinsic layer thickness and to the mobility gap of a thin interfacial layer grown at the p/i interface is explored with numerical techniques. Our results indicate that the reported experimental trends can be adequately explained with the defect pool model and not by assuming an uniform density of states in the intrinsic layer.  
dc.format
application/pdf  
dc.language.iso
eng  
dc.publisher
Elsevier Science Sa  
dc.rights
info:eu-repo/semantics/openAccess  
dc.rights.uri
https://creativecommons.org/licenses/by-nc-sa/2.5/ar/  
dc.subject
Defect Pool  
dc.subject
Amorphous Silicon  
dc.subject
Solar Cells  
dc.subject
Dark Current Voltage Characteristics  
dc.subject.classification
Ingeniería Eléctrica y Electrónica  
dc.subject.classification
Ingeniería Eléctrica, Ingeniería Electrónica e Ingeniería de la Información  
dc.subject.classification
INGENIERÍAS Y TECNOLOGÍAS  
dc.title
Evidences of the Defect Pool Model in the dark J-V characteristics of hydrogenated amorphous silicon based p-i-n devices  
dc.type
info:eu-repo/semantics/article  
dc.type
info:ar-repo/semantics/artículo  
dc.type
info:eu-repo/semantics/publishedVersion  
dc.date.updated
2017-06-29T13:36:35Z  
dc.journal.volume
516  
dc.journal.number
21  
dc.journal.pagination
7708-7714  
dc.journal.pais
Países Bajos  
dc.journal.ciudad
Amsterdam  
dc.description.fil
Fil: Sturiale, Alejandro Ernesto. Consejo Nacional de Investigaciones Científicas y Técnicas. Centro Científico Tecnológico Conicet - Santa Fe. Instituto de Desarrollo Tecnológico para la Industria Química. Universidad Nacional del Litoral. Instituto de Desarrollo Tecnológico para la Industria Química; Argentina  
dc.description.fil
Fil: Rubinelli, Francisco Alberto. Consejo Nacional de Investigaciones Científicas y Técnicas. Centro Científico Tecnológico Conicet - Santa Fe. Instituto de Desarrollo Tecnológico para la Industria Química. Universidad Nacional del Litoral. Instituto de Desarrollo Tecnológico para la Industria Química; Argentina  
dc.journal.title
Thin Solid Films  
dc.relation.alternativeid
info:eu-repo/semantics/altIdentifier/doi/http://dx.doi.org/10.1016/j.tsf.2008.04.002  
dc.relation.alternativeid
info:eu-repo/semantics/altIdentifier/url/http://www.sciencedirect.com/science/article/pii/S0040609008003544?via%3Dihub