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dc.contributor.author
Xia, Wei
dc.contributor.author
Mei, Bastian
dc.contributor.author
Sanchez, Miguel Dario
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dc.contributor.author
Strunk, Jennifer
dc.contributor.author
Muhler, Martin
dc.date.available
2020-04-14T23:44:53Z
dc.date.issued
2011-09
dc.identifier.citation
Xia, Wei; Mei, Bastian; Sanchez, Miguel Dario; Strunk, Jennifer; Muhler, Martin; TiO2 Coating of High Surface Area Silica Gel by Chemical Vapor Deposition of TiCl4 in a Fluidized-Bed Reactor; American Scientific Publishers; Journal of Nanoscience and Nanotechnology; 11; 9; 9-2011; 8152-8157
dc.identifier.issn
1533-4880
dc.identifier.uri
http://hdl.handle.net/11336/102593
dc.description.abstract
TiO2 was deposited on high surface area porous silica gel (400 m2g−1) in a fluidized bed reactor. Chemical vapor deposition was employed for the coating under vacuum conditions with TiCl4 as precursor. Nitrogen physisorption, X-ray diffraction, transmission electron microscopy, X-ray photoelectron spectroscopy and UV-vis spectroscopy were applied to characterize the obtained TiO2–SiO2 composites with different Ti loadings up to 5 wt%. Only a slight decrease in the specific surface area was detected at low Ti loadings. At a Ti loading of 2 wt%, TiO2 was found to be highly dispersed on the SiO2 surface likely in form of a thin film. At higher Ti loadings, two weak reflections corresponding to anatase TiO2 were observed in the diffraction patterns indicating the presence of crystalline bulk TiO2. High resolution XPS clearly distinguished two types of Ti species, i.e., Ti–O–Si at the interface and Ti–O–Ti in bulk TiO2. The presence of polymeric TiOx species at low Ti loadings was confirmed by a blue shift in the UV-vis spectra as compared to bulk TiO2. All these results point to a strong interaction between the TiO2 deposit and the porous SiO2 substrate especially at low Ti loadings
dc.format
application/pdf
dc.language.iso
eng
dc.publisher
American Scientific Publishers
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dc.rights
info:eu-repo/semantics/openAccess
dc.rights.uri
https://creativecommons.org/licenses/by-nc-sa/2.5/ar/
dc.subject
TiO2
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Chemical Vapor Deposition
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Fluidized-Bed Reactor
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Strong OxideOxide Interactions
dc.subject.classification
Otras Ingeniería Química
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dc.subject.classification
Ingeniería Química
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dc.subject.classification
INGENIERÍAS Y TECNOLOGÍAS
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dc.title
TiO2 Coating of High Surface Area Silica Gel by Chemical Vapor Deposition of TiCl4 in a Fluidized-Bed Reactor
dc.type
info:eu-repo/semantics/article
dc.type
info:ar-repo/semantics/artículo
dc.type
info:eu-repo/semantics/publishedVersion
dc.date.updated
2020-04-07T13:32:54Z
dc.identifier.eissn
1533-4899
dc.journal.volume
11
dc.journal.number
9
dc.journal.pagination
8152-8157
dc.journal.pais
Estados Unidos
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dc.journal.ciudad
California
dc.description.fil
Fil: Xia, Wei. Ruhr University Bochum; Alemania
dc.description.fil
Fil: Mei, Bastian. Ruhr University Bochum; Alemania
dc.description.fil
Fil: Sanchez, Miguel Dario. Ruhr University Bochum; Alemania. Consejo Nacional de Investigaciones Científicas y Técnicas. Centro Científico Tecnológico Conicet - Bahía Blanca. Instituto de Física del Sur. Universidad Nacional del Sur. Departamento de Física. Instituto de Física del Sur; Argentina
dc.description.fil
Fil: Strunk, Jennifer. Ruhr University Bochum; Alemania
dc.description.fil
Fil: Muhler, Martin. Ruhr University Bochum; Alemania
dc.journal.title
Journal of Nanoscience and Nanotechnology
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dc.relation.alternativeid
info:eu-repo/semantics/altIdentifier/doi/http://dx.doi.org/10.1166/jnn.2011.5107
dc.relation.alternativeid
info:eu-repo/semantics/altIdentifier/url/https://www.ingentaconnect.com/content/asp/jnn/2011/00000011/00000009/art00091;jsessionid=6arycysr1sdk.x-ic-live-03
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