Artículo
TiO2 Coating of High Surface Area Silica Gel by Chemical Vapor Deposition of TiCl4 in a Fluidized-Bed Reactor
Fecha de publicación:
09/2011
Editorial:
American Scientific Publishers
Revista:
Journal of Nanoscience and Nanotechnology
ISSN:
1533-4880
e-ISSN:
1533-4899
Idioma:
Inglés
Tipo de recurso:
Artículo publicado
Clasificación temática:
Resumen
TiO2 was deposited on high surface area porous silica gel (400 m2g−1) in a fluidized bed reactor. Chemical vapor deposition was employed for the coating under vacuum conditions with TiCl4 as precursor. Nitrogen physisorption, X-ray diffraction, transmission electron microscopy, X-ray photoelectron spectroscopy and UV-vis spectroscopy were applied to characterize the obtained TiO2–SiO2 composites with different Ti loadings up to 5 wt%. Only a slight decrease in the specific surface area was detected at low Ti loadings. At a Ti loading of 2 wt%, TiO2 was found to be highly dispersed on the SiO2 surface likely in form of a thin film. At higher Ti loadings, two weak reflections corresponding to anatase TiO2 were observed in the diffraction patterns indicating the presence of crystalline bulk TiO2. High resolution XPS clearly distinguished two types of Ti species, i.e., Ti–O–Si at the interface and Ti–O–Ti in bulk TiO2. The presence of polymeric TiOx species at low Ti loadings was confirmed by a blue shift in the UV-vis spectra as compared to bulk TiO2. All these results point to a strong interaction between the TiO2 deposit and the porous SiO2 substrate especially at low Ti loadings
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Identificadores
Colecciones
Articulos(IFISUR)
Articulos de INSTITUTO DE FISICA DEL SUR
Articulos de INSTITUTO DE FISICA DEL SUR
Citación
Xia, Wei; Mei, Bastian; Sanchez, Miguel Dario; Strunk, Jennifer; Muhler, Martin; TiO2 Coating of High Surface Area Silica Gel by Chemical Vapor Deposition of TiCl4 in a Fluidized-Bed Reactor; American Scientific Publishers; Journal of Nanoscience and Nanotechnology; 11; 9; 9-2011; 8152-8157
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