Artículo
Atomic surrounding of Co implanted in AlN at high energy
Fecha de publicación:
03/2001
Editorial:
Wiley Blackwell Publishing, Inc
Revista:
Journal of Synchrotron Radiation
ISSN:
0909-0495
Idioma:
Inglés
Tipo de recurso:
Artículo publicado
Clasificación temática:
Resumen
AlN bulk ceramic has been implanted with energetic Co ions. In order to accurately characterise the atomic surrounding of the implanted ions, X-ray absorption measurements were carried out at 80 K in the fluorescence mode at the Co K edge in the as-implanted and annealed states. Simulation of the EXAFS oscillations allowed us to identify a first stage where Co is inserted in the AlN matrix followed by a second stage where Co precipitates form.
Palabras clave:
ALN
,
COBALT
,
ION IMPLANTATION
Archivos asociados
Licencia
Identificadores
Colecciones
Articulos(IFLP)
Articulos de INST.DE FISICA LA PLATA
Articulos de INST.DE FISICA LA PLATA
Citación
Traverse, Agnès; Delobbe, Anne; Zanghi, Didier; Rentería, Mario; Gailhanou, Marc; Atomic surrounding of Co implanted in AlN at high energy; Wiley Blackwell Publishing, Inc; Journal of Synchrotron Radiation; 8; 2; 3-2001; 514-516
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