Artículo

Infrared multiphoton dissociation of SiF4: Gas phase reactions of SiF3 with F and H2

Alcaraz, A. N.; Codnia, Jorge; Azcárate, María LauraIcon
Fecha de publicación: 07/2004
Editorial: Elsevier Science Sa
Revista: Journal of Photochemistry and Photobiology A: Chemistry
ISSN: 1010-6030
Idioma: Inglés
Tipo de recurso: Artículo publicado
Clasificación temática:

Resumen

The infrared multiphoton dissociation (IRMPD) of pure SiF4 and in mixtures with different gases was studied using a tunable CO2 TEA laser. The initial dissociation step of the IRMPD of SiF4 was found to be the decomposition into SiF3 and F. The gas phase reactions of trifluorosilyl, SiF3, with F and H2 was investigated. A kinetic scheme was proposed to explain the experimental results. The set of coupled differential equations associated to this scheme was numerically solved. The rate constants of the SiF3+F→SiF4 and SiF3+H 2→SiF3H+H reactions were determined.
Palabras clave: Infrared Multiphoton Dissociation , Reaction Rate , Silicon Tetrafluoride , Trifluorosilyl
 
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info:eu-repo/semantics/openAccess Excepto donde se diga explícitamente, este item se publica bajo la siguiente descripción: Creative Commons Attribution-NonCommercial-ShareAlike 2.5 Unported (CC BY-NC-SA 2.5)
Identificadores
URI: http://hdl.handle.net/11336/82171
URL: https://www.sciencedirect.com/science/article/pii/S1010603004001443
DOI: https://doi.org/10.1016/j.jphotochem.2004.03.019
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Articulos(UNIDEF)
Articulos de UNIDAD DE INVESTIGACION Y DESARROLLO ESTRATEGICOS PARA LA DEFENSA
Citación
Alcaraz, A. N.; Codnia, Jorge; Azcárate, María Laura; Infrared multiphoton dissociation of SiF4: Gas phase reactions of SiF3 with F and H2; Elsevier Science Sa; Journal of Photochemistry and Photobiology A: Chemistry; 165; 1-3; 7-2004; 209-214
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