Artículo

SiF4 IR Photodissociation: Gas phase reactions of SiF3 with CH4

Alcaraz, A. N.; Codnia, Jorge; Azcárate, María LauraIcon
Fecha de publicación: 06/2009
Editorial: Elsevier Science Sa
Revista: Journal of Photochemistry and Photobiology A: Chemistry
ISSN: 1010-6030
Idioma: Inglés
Tipo de recurso: Artículo publicado
Clasificación temática:

Resumen

The infrared multiphoton dissociation (IRMPD) of SiF4 in the presence of CH4 has been studied using a tunable CO2 TEA laser. The siliconated reaction products have been identified. A kinetic scheme has been proposed to explain the experimental results. The reaction rate constant of the trifluorosilyl radical, SiF3, with CH4 has been obtained from the numerical solution of the differential equation system associated to the kinetic mechanism proposed as well as from non-linear regression methods. It has been additionally found that this reaction occurs through two channels. The relative importance of each and their reaction rate constants have been determined as well.
Palabras clave: Infrared Multiphoton Dissociation , Reaction Rate , Silicon Tetrafluoride , Trifluorosilyl
 
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info:eu-repo/semantics/openAccess Excepto donde se diga explícitamente, este item se publica bajo la siguiente descripción: Creative Commons Attribution-NonCommercial-ShareAlike 2.5 Unported (CC BY-NC-SA 2.5)
Identificadores
URI: http://hdl.handle.net/11336/82011
URL: https://www.sciencedirect.com/science/article/pii/S1010603009001488
DOI: https://doi.org/10.1016/j.jphotochem.2009.04.009
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Articulos(UNIDEF)
Articulos de UNIDAD DE INVESTIGACION Y DESARROLLO ESTRATEGICOS PARA LA DEFENSA
Citación
Alcaraz, A. N.; Codnia, Jorge; Azcárate, María Laura; SiF4 IR Photodissociation: Gas phase reactions of SiF3 with CH4; Elsevier Science Sa; Journal of Photochemistry and Photobiology A: Chemistry; 205; 2-3; 6-2009; 79-83
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