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dc.contributor.author
Lin, Derong
dc.contributor.author
Hu, Lijiang
dc.contributor.author
You, Hong
dc.contributor.author
Williams, Roberto Juan Jose
dc.date.available
2016-10-27T17:27:56Z
dc.date.issued
2011-05-17
dc.identifier.citation
Lin, Derong; Hu, Lijiang; You, Hong; Williams, Roberto Juan Jose; Synthesis and characterization of a nanostructured photoluminescent silsesquioxane containing urea and dodecyl groups that can be patterned on carbon films; Elsevier; European Polymer Journal; 47; 8; 17-5-2011; 1526-1533
dc.identifier.issn
0014-3057
dc.identifier.uri
http://hdl.handle.net/11336/7824
dc.description.abstract
A silsesquioxane was synthesized by the hydrolysis and polycondensation of (EtO)3-Si(CH2)3NHCONH(CH2)11CH3 in tetrahydrofuran (THF) employing formic acid as catalyst. The silsesquioxane self-assembled into nanorods due to the strong H-bonds among urea groups and the tail-to-tail associations of organic chains. The nanostructuration was characterized by a variety of experimental techniques (FTIR, 29Si NMR, XRD, TEM, HRTEM, and SAED). A colloidal solution of the silsesquioxane in methanol was deposited on a carbon film generating coffee ring structures with nanoparticles located at the boundary of rings. The significance of these results is related to the intrinsic photoluminescence of silsesquioxanes containing urea groups. The possibility of patterning these hybrid polymers on a surface can give place to materials exhibiting periodically modulated optical properties with potential applications in optoelectronics and light-emitting devices.
dc.format
application/pdf
dc.language.iso
eng
dc.publisher
Elsevier
dc.rights
info:eu-repo/semantics/openAccess
dc.rights.uri
https://creativecommons.org/licenses/by-nc-sa/2.5/ar/
dc.subject
Coffee-Ring Structures
dc.subject
Nanorods
dc.subject
Patterning
dc.subject
Silsesquioxanes
dc.subject.classification
Nano-materiales
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Nanotecnología
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INGENIERÍAS Y TECNOLOGÍAS
dc.title
Synthesis and characterization of a nanostructured photoluminescent silsesquioxane containing urea and dodecyl groups that can be patterned on carbon films
dc.type
info:eu-repo/semantics/article
dc.type
info:ar-repo/semantics/artículo
dc.type
info:eu-repo/semantics/publishedVersion
dc.date.updated
2016-10-26T21:20:16Z
dc.journal.volume
47
dc.journal.number
8
dc.journal.pagination
1526-1533
dc.journal.pais
Países Bajos
dc.journal.ciudad
Amsterdam
dc.description.fil
Fil: Lin, Derong. Harbin Institute of Technology; China
dc.description.fil
Fil: Hu, Lijiang. Harbin Institute of Technology; China
dc.description.fil
Fil: You, Hong. Harbin Institute of Technology; China
dc.description.fil
Fil: Williams, Roberto Juan Jose. Consejo Nacional de Investigaciones Científicas y Técnicas. Centro Científico Tecnológico Mar del Plata. Instituto de Investigación En Ciencia y Tecnología de Materiales (i); Argentina
dc.journal.title
European Polymer Journal
dc.relation.alternativeid
info:eu-repo/semantics/altIdentifier/doi/http://dx.doi.org/10.1016/j.eurpolymj.2011.05.013
dc.relation.alternativeid
info:eu-repo/semantics/altIdentifier/issn/0014-3057
dc.relation.alternativeid
info:eu-repo/semantics/altIdentifier/url/http://www.sciencedirect.com/science/article/pii/S0014305711002047
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