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dc.contributor.author
Xu, G. J.
dc.contributor.author
Nakayama, Koji S.
dc.contributor.author
Trenhaile, B.R.
dc.contributor.author
Aldao, Celso Manuel
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dc.contributor.author
Weaver, J. H.
dc.date.available
2019-05-24T18:47:26Z
dc.date.issued
2003-03
dc.identifier.citation
Xu, G. J.; Nakayama, Koji S.; Trenhaile, B.R.; Aldao, Celso Manuel; Weaver, J. H.; Equilibrium morphologies for Cl-roughened Si(100) at 700–750 K: Dependence on Cl concentration; American Physical Society; Physical Review B: Condensed Matter and Materials Physics; 67; 12; 3-2003; 1-6; 125321
dc.identifier.issn
1098-0121
dc.identifier.uri
http://hdl.handle.net/11336/77067
dc.description.abstract
Adsorbed halogen atoms on Si(100)-(2×1) can induce roughening at temperatures where material removal (etching) is minimal. Variable temperature scanning tunneling microscopy was used to follow roughening at 700–750 K for surfaces with 0.1–0.99 ML of Cl. Dimer vacancies and Si adatoms were observed at short times, and at longer times the progression toward a state of dynamic equilibrium was traced. Once dynamic equilibrium was reached, the appearance of individual pits and regrowth islands changed but their densities and mean sizes did not. The results show that the roughness depends nonlinearly on Cl coverage with surfaces having 0.3 ML being nearly ten times rougher than those with 0.1 ML. The importance of Cl-free dimers is stressed, and the role of Cl as an impediment for vacancy and adatom diffusion is demonstrated. Roughening is attributed mainly to adsorbate-adsorbate repulsive interactions.
dc.format
application/pdf
dc.language.iso
eng
dc.publisher
American Physical Society
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dc.rights
info:eu-repo/semantics/openAccess
dc.rights.uri
https://creativecommons.org/licenses/by-nc-sa/2.5/ar/
dc.subject.classification
Otras Ciencias Físicas
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dc.subject.classification
Ciencias Físicas
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dc.subject.classification
CIENCIAS NATURALES Y EXACTAS
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dc.title
Equilibrium morphologies for Cl-roughened Si(100) at 700–750 K: Dependence on Cl concentration
dc.type
info:eu-repo/semantics/article
dc.type
info:ar-repo/semantics/artículo
dc.type
info:eu-repo/semantics/publishedVersion
dc.date.updated
2019-05-15T16:44:16Z
dc.journal.volume
67
dc.journal.number
12
dc.journal.pagination
1-6; 125321
dc.journal.pais
Estados Unidos
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dc.description.fil
Fil: Xu, G. J.. University of Illinois at Urbana; Estados Unidos
dc.description.fil
Fil: Nakayama, Koji S.. University of Illinois at Urbana; Estados Unidos
dc.description.fil
Fil: Trenhaile, B.R.. University of Illinois at Urbana; Estados Unidos
dc.description.fil
Fil: Aldao, Celso Manuel. Consejo Nacional de Investigaciones Científicas y Técnicas. Centro Científico Tecnológico Conicet - Mar del Plata. Instituto de Investigaciones en Ciencia y Tecnología de Materiales. Universidad Nacional de Mar del Plata. Facultad de Ingeniería. Instituto de Investigaciones en Ciencia y Tecnología de Materiales; Argentina
dc.description.fil
Fil: Weaver, J. H.. University of Illinois at Urbana; Estados Unidos
dc.journal.title
Physical Review B: Condensed Matter and Materials Physics
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dc.relation.alternativeid
info:eu-repo/semantics/altIdentifier/url/https://journals.aps.org/prb/abstract/10.1103/PhysRevB.67.125321
dc.relation.alternativeid
info:eu-repo/semantics/altIdentifier/doi/http://dx.doi.org/10.1103/PhysRevB.67.125321
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