Artículo
Automated and inexpensive method to manufacture solid- state nanopores and micropores in robust silicon wafers
Vega Moreno, Milena Amparo
; Granell, Pablo Nicolás; Lasorsa, Carlos Alberto; Lerner, Betiana
; Perez, Maximiliano Sebastian
Fecha de publicación:
02/2016
Editorial:
Institute of Physics Publishing
Revista:
Journal of Physics: Conference Series
ISSN:
1742-6596
Idioma:
Inglés
Tipo de recurso:
Artículo publicado
Clasificación temática:
Resumen
In this work an easy, reproducible and inexpensive technique for the production of solid state nanopores and micropores using silicon wafer substrate is proposed. The technique is based on control of pore formation, by neutralization etchant (KOH) with a strong acid (HCl). Thus, a local neutralization is produced around the nanopore, which stops the silicon etching. The etching process was performed with 7M KOH at 80°C, where 1.23μ m/min etching speed was obtained, similar to those published in literature. The control of the pore formation with the braking acid method was done using 12M HCl and different extreme conditions: i) at 25°C, ii) at 80°C and iii) at 80°C applying an electric potential. In these studies, it was found that nanopores and micropores can be obtained automatically and at a low cost. Additionally, the process was optimized to obtain clean silicon wafers after the pore fabrication process. This method opens the possibility for an efficient scale-up from laboratory production.
Palabras clave:
Nanopore
,
Silicon Wafer
,
Method
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Citación
Vega Moreno, Milena Amparo; Granell, Pablo Nicolás; Lasorsa, Carlos Alberto; Lerner, Betiana; Perez, Maximiliano Sebastian; Automated and inexpensive method to manufacture solid- state nanopores and micropores in robust silicon wafers; Institute of Physics Publishing; Journal of Physics: Conference Series; 687; 1; 2-2016; 1-4
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