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dc.contributor.author
Alburquenque, Daniela
dc.contributor.author
Bracamonte, Maria Victoria
dc.contributor.author
Del Canto, Marcela
dc.contributor.author
Pereira, Alejandro
dc.contributor.author
Escrig, Juan
dc.date.available
2018-11-20T14:25:00Z
dc.date.issued
2017-12
dc.identifier.citation
Alburquenque, Daniela; Bracamonte, Maria Victoria; Del Canto, Marcela; Pereira, Alejandro; Escrig, Juan; Dewetting of Co thin films obtained by atomic layer deposition due to the thermal reduction process; Cambridge University Press; MRS Communications; 7; 4; 12-2017; 848-853
dc.identifier.issn
2159-6859
dc.identifier.uri
http://hdl.handle.net/11336/64721
dc.description.abstract
Cobalt oxide thin films with different thicknesses were synthesized by atomic layer deposition. After a thermal reduction process, under a controlled atmosphere of hydrogen, it was possible to convert cobalt oxide to metallic cobalt. The different thicknesses were obtained considering from 500 to 2000 cycles of CoCp2/O3. The thin films were characterized by x-ray diffraction, scanning electron microscopy, energy-dispersive x-ray microanalysis, and by magneto-optical Kerr effect measurements. The indirect synthesis process allows us to obtain cobalt oxide and cobalt thin films with controlled thicknesses and extraordinary magnetic properties, with coercivities above 500 Oe.
dc.format
application/pdf
dc.language.iso
eng
dc.publisher
Cambridge University Press
dc.rights
info:eu-repo/semantics/openAccess
dc.rights.uri
https://creativecommons.org/licenses/by-nc-sa/2.5/ar/
dc.subject
Cobalt
dc.subject
Thin Films
dc.subject
Atomic Layer Deposition
dc.subject.classification
Astronomía
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Ciencias Físicas
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CIENCIAS NATURALES Y EXACTAS
dc.title
Dewetting of Co thin films obtained by atomic layer deposition due to the thermal reduction process
dc.type
info:eu-repo/semantics/article
dc.type
info:ar-repo/semantics/artículo
dc.type
info:eu-repo/semantics/publishedVersion
dc.date.updated
2018-10-23T21:20:10Z
dc.identifier.eissn
1873-4189
dc.journal.volume
7
dc.journal.number
4
dc.journal.pagination
848-853
dc.journal.pais
Reino Unido
dc.journal.ciudad
Cambridge
dc.description.fil
Fil: Alburquenque, Daniela. Universidad de Santiago de Chile; Chile
dc.description.fil
Fil: Bracamonte, Maria Victoria. Consejo Nacional de Investigaciones Científicas y Técnicas. Centro Científico Tecnológico Conicet - Córdoba. Instituto de Física Enrique Gaviola. Universidad Nacional de Córdoba. Instituto de Física Enrique Gaviola; Argentina. Universidad Nacional de Córdoba. Facultad de Matemática, Astronomía y Física; Argentina
dc.description.fil
Fil: Del Canto, Marcela. Center for the Development of Nanoscience and Nanotechnology; Chile
dc.description.fil
Fil: Pereira, Alejandro. Center for the Development of Nanoscience and Nanotechnology; Chile
dc.description.fil
Fil: Escrig, Juan. Universidad de Santiago de Chile; Chile
dc.journal.title
MRS Communications
dc.relation.alternativeid
info:eu-repo/semantics/altIdentifier/doi/https://dx.doi.org/10.1557/mrc.2017.94
dc.relation.alternativeid
info:eu-repo/semantics/altIdentifier/url/https://www.cambridge.org/core/journals/mrs-communications/article/dewetting-of-co-thin-films-obtained-by-atomic-layer-deposition-due-to-the-thermal-reduction-process/A50F0E55589F12B9AB5ED7174E9FD47C
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