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dc.contributor.author
Alburquenque, Daniela  
dc.contributor.author
Bracamonte, Maria Victoria  
dc.contributor.author
Del Canto, Marcela  
dc.contributor.author
Pereira, Alejandro  
dc.contributor.author
Escrig, Juan  
dc.date.available
2018-11-20T14:25:00Z  
dc.date.issued
2017-12  
dc.identifier.citation
Alburquenque, Daniela; Bracamonte, Maria Victoria; Del Canto, Marcela; Pereira, Alejandro; Escrig, Juan; Dewetting of Co thin films obtained by atomic layer deposition due to the thermal reduction process; Cambridge University Press; MRS Communications; 7; 4; 12-2017; 848-853  
dc.identifier.issn
2159-6859  
dc.identifier.uri
http://hdl.handle.net/11336/64721  
dc.description.abstract
Cobalt oxide thin films with different thicknesses were synthesized by atomic layer deposition. After a thermal reduction process, under a controlled atmosphere of hydrogen, it was possible to convert cobalt oxide to metallic cobalt. The different thicknesses were obtained considering from 500 to 2000 cycles of CoCp2/O3. The thin films were characterized by x-ray diffraction, scanning electron microscopy, energy-dispersive x-ray microanalysis, and by magneto-optical Kerr effect measurements. The indirect synthesis process allows us to obtain cobalt oxide and cobalt thin films with controlled thicknesses and extraordinary magnetic properties, with coercivities above 500 Oe.  
dc.format
application/pdf  
dc.language.iso
eng  
dc.publisher
Cambridge University Press  
dc.rights
info:eu-repo/semantics/openAccess  
dc.rights.uri
https://creativecommons.org/licenses/by-nc-sa/2.5/ar/  
dc.subject
Cobalt  
dc.subject
Thin Films  
dc.subject
Atomic Layer Deposition  
dc.subject.classification
Astronomía  
dc.subject.classification
Ciencias Físicas  
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CIENCIAS NATURALES Y EXACTAS  
dc.title
Dewetting of Co thin films obtained by atomic layer deposition due to the thermal reduction process  
dc.type
info:eu-repo/semantics/article  
dc.type
info:ar-repo/semantics/artículo  
dc.type
info:eu-repo/semantics/publishedVersion  
dc.date.updated
2018-10-23T21:20:10Z  
dc.identifier.eissn
1873-4189  
dc.journal.volume
7  
dc.journal.number
4  
dc.journal.pagination
848-853  
dc.journal.pais
Reino Unido  
dc.journal.ciudad
Cambridge  
dc.description.fil
Fil: Alburquenque, Daniela. Universidad de Santiago de Chile; Chile  
dc.description.fil
Fil: Bracamonte, Maria Victoria. Consejo Nacional de Investigaciones Científicas y Técnicas. Centro Científico Tecnológico Conicet - Córdoba. Instituto de Física Enrique Gaviola. Universidad Nacional de Córdoba. Instituto de Física Enrique Gaviola; Argentina. Universidad Nacional de Córdoba. Facultad de Matemática, Astronomía y Física; Argentina  
dc.description.fil
Fil: Del Canto, Marcela. Center for the Development of Nanoscience and Nanotechnology; Chile  
dc.description.fil
Fil: Pereira, Alejandro. Center for the Development of Nanoscience and Nanotechnology; Chile  
dc.description.fil
Fil: Escrig, Juan. Universidad de Santiago de Chile; Chile  
dc.journal.title
MRS Communications  
dc.relation.alternativeid
info:eu-repo/semantics/altIdentifier/doi/https://dx.doi.org/10.1557/mrc.2017.94  
dc.relation.alternativeid
info:eu-repo/semantics/altIdentifier/url/https://www.cambridge.org/core/journals/mrs-communications/article/dewetting-of-co-thin-films-obtained-by-atomic-layer-deposition-due-to-the-thermal-reduction-process/A50F0E55589F12B9AB5ED7174E9FD47C