Artículo
Plasma focus based flash hard X-ray source in the 100 keV region with reproducible spectrum
Fecha de publicación:
10/2010
Editorial:
Elsevier Science
Revista:
Physics Letters A
ISSN:
0375-9601
Idioma:
Inglés
Tipo de recurso:
Artículo publicado
Clasificación temática:
Resumen
A pulsed hard X-ray source with shot to shot reproducible spectrum, based on a 4.7 kJ small-chamber Mather-type plasma focus device, is presented. The hard X-ray output spectrum was measured in a single shot basis by differential absorption on metallic plates. The measured spectra have a single dominant peak around 75 keV and a spectral bandwidth covering the 40-150 keV range. A hard X-ray dose of (53±3) μGy per shot was measured on axis at 53 cm from the source, and found to be uniform within a half aperture angle of 6°. © 2010 Elsevier B.V.
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Identificadores
Colecciones
Articulos(INFINA)
Articulos de INST.DE FISICA DEL PLASMA
Articulos de INST.DE FISICA DEL PLASMA
Citación
Raspa, Veronica Diana; Knoblauch, Pablo; Di Lorenzo, Francisco Javier; Moreno, Cesar Hugo; Plasma focus based flash hard X-ray source in the 100 keV region with reproducible spectrum; Elsevier Science; Physics Letters A; 374; 46; 10-2010; 4675-4677
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