Artículo
Phase Transformation of TiO2 Thin Films in Function Bias Voltage
Franco Arias, Lina Maria
; Fazio, Mariana Andrea
; Halac, Emilia Beatriz; Vega, Daniel Alberto
; Heredia, Eduardo Armando; Kleiman, Ariel Javier
; Marquez, Adriana Beatriz
Fecha de publicación:
09/2015
Editorial:
Elsevier
Revista:
Procedia materials science
ISSN:
2211-8128
Idioma:
Inglés
Tipo de recurso:
Artículo publicado
Clasificación temática:
Resumen
Titanium dioxide thin films have been deposited on silicon (100) and 316L stainless steel substrates by cathodic arc deposition in oxygen atmosphere with a titanium cathode. The process was run at room temperature and at 300 °C, biasing the substrate with pulsed voltage (up to ?10 kV) and DC voltage (up to ?120 V). The crystalline structure was studied by Raman spectroscopy and X-ray diffraction. At room temperature, the films were obtained with an amorphous base with small isolated crystals of rutile and anatase. At 300 °C, with DC bias, samples grew crystalline with the presence of both anatase and rutile.
Palabras clave:
Titanium Dioxide
,
Cathodic Arc
,
Raman Spectroscopy
Archivos asociados
Licencia
Identificadores
Colecciones
Articulos(INFINA)
Articulos de INST.DE FISICA DEL PLASMA
Articulos de INST.DE FISICA DEL PLASMA
Citación
Franco Arias, Lina Maria; Fazio, Mariana Andrea; Halac, Emilia Beatriz; Vega, Daniel Alberto; Heredia, Eduardo Armando; et al.; Phase Transformation of TiO2 Thin Films in Function Bias Voltage; Elsevier; Procedia materials science; 593; 9-2015; 39-45
Compartir
Altmétricas