Artículo
Electrodeposition of Cu-Sn alloys from a methanesulfonic acid electrolyte containing benzyl alcohol
Fecha de publicación:
12/2017
Editorial:
Pergamon-Elsevier Science Ltd
Revista:
Electrochimica Acta
ISSN:
0013-4686
Idioma:
Inglés
Tipo de recurso:
Artículo publicado
Clasificación temática:
Resumen
Deposition of Cu-Sn alloys from a methanesulfonic acid electrolyte containing small amounts of benzyl alcohol was investigated. Polarisation experiments (cylic and linear sweep voltammetry) were carried out using a rotating disc electrode to identify the reduction and dissolution processes that take place in the system and to determine the effect of the solution constituents on them. Potentiostatic deposition was performed onto a rotating cylinder electrode and the resulting deposits were charactised using SEM and XRD. The results showed that co-deposition of copper and tin is possible even at potentials less cathodic than tin discharge potential. The latter was attributed to the underpotential deposition of Sn2+ on a copper substrate. Smooth and compact deposits were obtained at various deposition potentials and Cu2+ concentrations, with Sn contents between 1.6 - 62.4 wt.%. Several stable phases, such as pure copper, α-CuSn, ϵ-Cu3Sn and η′-Cu6Sn5 phase, were detected at different operating conditions. Finally, it was found that BA increases the amount of tin in the deposit when Cu2+ concentrations in the solution is kept low, especially at high overpotentials. This additive also inhibits the formation of dendrites and reduces surface roughness.
Palabras clave:
Copper
,
Cyanide-Free
,
Electrodeposition
,
Methanesulfonic Acid
,
Tin
Archivos asociados
Licencia
Identificadores
Colecciones
Articulos(CIDEPINT)
Articulos de CENTRO DE INV EN TECNOLOGIA DE PINTURAS (I)
Articulos de CENTRO DE INV EN TECNOLOGIA DE PINTURAS (I)
Citación
Bengoa, Leandro Nicolás; Pary, Paola; Conconi, María Susana; Egli, Walter Alfredo; Electrodeposition of Cu-Sn alloys from a methanesulfonic acid electrolyte containing benzyl alcohol; Pergamon-Elsevier Science Ltd; Electrochimica Acta; 256; 12-2017; 211-219
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