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dc.contributor.author Ravelli, L.
dc.contributor.author Macchi, Carlos Eugenio
dc.contributor.author Mariazzi, S.
dc.contributor.author Mazzoldi, P.
dc.contributor.author Egger, W.
dc.contributor.author Hugenschmidt, C.
dc.contributor.author Somoza, Alberto Horacio
dc.contributor.author Brusa, R. S.
dc.date.available 2016-03-04T13:04:29Z
dc.date.issued 2015-11
dc.identifier.citation Ravelli, L.; Macchi, Carlos Eugenio; Mariazzi, S.; Mazzoldi, P.; Egger, W.; et al.; Interstitial oxygen related defects and nanovoids in Au implanted a-SiO2 glass depth profiled by positron annihilation spectroscopy; IOP Publishing; Journal Of Physics D: Applied Physics; 48; 49; 11-2015; 495302-495302
dc.identifier.issn 0022-3727
dc.identifier.uri http://hdl.handle.net/11336/4604
dc.description.abstract Samples of amorphous silica were implanted with Au ions at an energy of 190 keV and fluences of 1×1014 ions cm−2and 5×1014 ions cm−2 at room temperature. The damage produced by ion implantation and its evolution with the thermal treatment at 800 °C for one hour in nitrogen atmosphere was depth profiled using three positron annihilation techniques: Doppler broadening spectroscopy, positron annihilation lifetime spectroscopy and coincidence Doppler broadening spectroscopy. Around the ion projected range of Rp = 67 nm, a size reduction of the silica matrix intrinsic nanovoids points out a local densification ofthe material. Oxygen related defects were found to be present at depths four times the ion projected range, showing a high mobility of oxygen molecules from the densified and stressed region towards the bulk. The 800 °C thermal treatment leads to a recovery of the silica intrinsic nanovoids only in the deeper damaged region and the defect distribution, probed by positrons, shrinks around the ion projected range where the Au atoms aggregate. Open volume defects at the interface between Au and the amorphous matrix were evidenced in both the asimplanted and in the thermal treated samples. A practically complete disappearance of the intrinsic nanovoids was observed around Rp when the implantation fluence was increased by two orders of magnitude (3×1016 ions cm−2). In this case, the oxygen defects move to a depth five times larger than Rp.
dc.format application/pdf
dc.language.iso eng
dc.publisher IOP Publishing
dc.rights info:eu-repo/semantics/restrictedAccess
dc.rights.uri https://creativecommons.org/licenses/by-nc-sa/2.5/ar/
dc.subject Glass
dc.subject Amorphous SiO2
dc.subject Au implantation
dc.subject Positrons
dc.subject Positronium
dc.subject Nanovoids
dc.subject.classification Física de los Materiales Condensados
dc.subject.classification Ciencias Físicas
dc.subject.classification CIENCIAS NATURALES Y EXACTAS
dc.title Interstitial oxygen related defects and nanovoids in Au implanted a-SiO2 glass depth profiled by positron annihilation spectroscopy
dc.type info:eu-repo/semantics/article
dc.type info:ar-repo/semantics/artículo
dc.type info:eu-repo/semantics/publishedVersion
dc.date.updated 2016-03-30 10:35:44.97925-03
dc.journal.volume 48
dc.journal.number 49
dc.journal.pagination 495302-495302
dc.journal.pais Reino Unido
dc.journal.ciudad Bristol
dc.description.fil Fil: Ravelli, L.. Universitá di Trento. Dipartamento di Fisica; Italia
dc.description.fil Fil: Macchi, Carlos Eugenio. Consejo Nacional de Investigaciones Científicas y Técnicas. Centro Científico Tecnológico Tandil. Centro de Investigaciones En Física E Ingeniería del Centro de la Provincia de Buenos Aires; Argentina. Universidad Nacional del Centro de la Provincia de Buenos Aires. Facultad de Ciencias Exactas. Instituto de Física de Materiales; Argentina
dc.description.fil Fil: Mariazzi, S.. Stefan-Meyer-Institut für subatomare Physik; Austria
dc.description.fil Fil: Mazzoldi, P.. Università di Padova. Dipartimento di Fisica; Italia
dc.description.fil Fil: Egger, W.. Universität der Bunderswehr. Institut für Angewandte Physik und Messtechnik; Alemania
dc.description.fil Fil: Hugenschmidt, C.. Technische Universität München. Physik Department; Alemania
dc.description.fil Fil: Somoza, Alberto Horacio. Consejo Nacional de Investigaciones Científicas y Técnicas. Centro Científico Tecnológico Tandil. Centro de Investigaciones en Física e Ingeniería del Centro de la Provincia de Buenos Aires; Argentina. Universidad Nacional del Centro de la Provincia de Buenos Aires. Facultad de Ciencias Exactas. Instituto de Física de Materiales; Argentina. Provincia de Buenos Aires. Gobernación. Comisión de Investigaciones Científicas; Argentina
dc.description.fil Fil: Brusa, R. S.. Universitá di Trento. Dipartamento di Fisica; Italia
dc.journal.title Journal Of Physics D: Applied Physics
dc.relation.alternativeid info:eu-repo/semantics/altIdentifier/url/http://iopscience.iop.org/article/10.1088/0022-3727/48/49/495302/meta
dc.relation.alternativeid info:eu-repo/semantics/altIdentifier/doi/http://dx.doi.org/10.1088/0022-3727/48/49/495302
dc.relation.alternativeid info:eu-repo/semantics/altIdentifier/issn/0022-3727


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info:eu-repo/semantics/restrictedAccess Excepto donde se diga explícitamente, este item se publica bajo la siguiente descripción: Creative Commons Attribution-NonCommercial-ShareAlike 2.5 Unported (CC BY-NC-SA 2.5)