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dc.contributor.author
Ravelli, L.
dc.contributor.author
Macchi, Carlos Eugenio
dc.contributor.author
Mariazzi, S.
dc.contributor.author
Mazzoldi, P.
dc.contributor.author
Egger, W.
dc.contributor.author
Hugenschmidt, C.
dc.contributor.author
Somoza, Alberto Horacio
dc.contributor.author
Brusa, R. S.
dc.date.available
2016-03-04T13:04:29Z
dc.date.issued
2015-11
dc.identifier.citation
Ravelli, L.; Macchi, Carlos Eugenio; Mariazzi, S.; Mazzoldi, P.; Egger, W.; et al.; Interstitial oxygen related defects and nanovoids in Au implanted a-SiO2 glass depth profiled by positron annihilation spectroscopy; IOP Publishing; Journal Of Physics D: Applied Physics; 48; 49; 11-2015; 495302-495302
dc.identifier.issn
0022-3727
dc.identifier.uri
http://hdl.handle.net/11336/4604
dc.description.abstract
Samples of amorphous silica were implanted with Au ions at an energy of 190 keV and fluences of 1×1014 ions cm−2and 5×1014 ions cm−2 at room temperature. The damage produced by ion implantation and its evolution with the thermal treatment at 800 °C for one hour in nitrogen atmosphere was depth profiled using three positron annihilation techniques: Doppler broadening spectroscopy, positron annihilation lifetime spectroscopy and coincidence Doppler broadening spectroscopy. Around the ion projected range of Rp = 67 nm, a size reduction of the silica matrix intrinsic nanovoids points out a local densification ofthe material. Oxygen related defects were found to be present at depths four times the ion projected range, showing a high mobility of oxygen molecules from the densified and stressed region towards the bulk. The 800 °C thermal treatment leads to a recovery of the silica intrinsic nanovoids only in the deeper damaged region and the defect distribution, probed by positrons, shrinks around the ion projected range where the Au atoms aggregate. Open volume defects at the interface between Au and the amorphous matrix were evidenced in both the asimplanted and in the thermal treated samples. A practically complete disappearance of the intrinsic nanovoids was observed around Rp when the implantation fluence was increased by two orders of magnitude (3×1016 ions cm−2). In this case, the oxygen defects move to a depth five times larger than Rp.
dc.format
application/pdf
dc.language.iso
eng
dc.publisher
IOP Publishing
dc.rights
info:eu-repo/semantics/restrictedAccess
dc.rights.uri
https://creativecommons.org/licenses/by-nc-sa/2.5/ar/
dc.subject
Glass
dc.subject
Amorphous Sio2
dc.subject
Au Implantation
dc.subject
Positrons
dc.subject
Positronium
dc.subject
Nanovoids
dc.subject.classification
Física de los Materiales Condensados
dc.subject.classification
Ciencias Físicas
dc.subject.classification
CIENCIAS NATURALES Y EXACTAS
dc.title
Interstitial oxygen related defects and nanovoids in Au implanted a-SiO2 glass depth profiled by positron annihilation spectroscopy
dc.type
info:eu-repo/semantics/article
dc.type
info:ar-repo/semantics/artículo
dc.type
info:eu-repo/semantics/publishedVersion
dc.date.updated
2016-03-30 10:35:44.97925-03
dc.journal.volume
48
dc.journal.number
49
dc.journal.pagination
495302-495302
dc.journal.pais
Reino Unido
dc.journal.ciudad
Bristol
dc.description.fil
Fil: Ravelli, L.. Universitá di Trento. Dipartamento di Fisica; Italia
dc.description.fil
Fil: Macchi, Carlos Eugenio. Consejo Nacional de Investigaciones Científicas y Técnicas. Centro Científico Tecnológico Tandil. Centro de Investigaciones En Física E Ingeniería del Centro de la Provincia de Buenos Aires; Argentina. Universidad Nacional del Centro de la Provincia de Buenos Aires. Facultad de Ciencias Exactas. Instituto de Física de Materiales; Argentina
dc.description.fil
Fil: Mariazzi, S.. Stefan-Meyer-Institut für subatomare Physik; Austria
dc.description.fil
Fil: Mazzoldi, P.. Università di Padova. Dipartimento di Fisica; Italia
dc.description.fil
Fil: Egger, W.. Universität der Bunderswehr. Institut für Angewandte Physik und Messtechnik; Alemania
dc.description.fil
Fil: Hugenschmidt, C.. Technische Universität München. Physik Department; Alemania
dc.description.fil
Fil: Somoza, Alberto Horacio. Consejo Nacional de Investigaciones Científicas y Técnicas. Centro Científico Tecnológico Tandil. Centro de Investigaciones en Física e Ingeniería del Centro de la Provincia de Buenos Aires; Argentina. Universidad Nacional del Centro de la Provincia de Buenos Aires. Facultad de Ciencias Exactas. Instituto de Física de Materiales; Argentina. Provincia de Buenos Aires. Gobernación. Comisión de Investigaciones Científicas; Argentina
dc.description.fil
Fil: Brusa, R. S.. Universitá di Trento. Dipartamento di Fisica; Italia
dc.journal.title
Journal Of Physics D: Applied Physics
dc.relation.alternativeid
info:eu-repo/semantics/altIdentifier/url/http://iopscience.iop.org/article/10.1088/0022-3727/48/49/495302/meta
dc.relation.alternativeid
info:eu-repo/semantics/altIdentifier/doi/http://dx.doi.org/10.1088/0022-3727/48/49/495302
dc.relation.alternativeid
info:eu-repo/semantics/altIdentifier/issn/0022-3727


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