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dc.contributor.author
Aldao, Celso Manuel
dc.contributor.author
Agrawal, Abhishek
dc.contributor.author
Butera, R. E.
dc.contributor.author
Weaver, J. H.
dc.date.available
2018-01-29T19:01:57Z
dc.date.issued
2008-10-29
dc.identifier.citation
Aldao, Celso Manuel; Agrawal, Abhishek; Butera, R. E.; Weaver, J. H.; Atomic processes during Cl supersaturation etching of Si(100)-(2x1); American Physical Society; Physical Review B; 79; 12; 29-10-2008; 125303-125303
dc.identifier.issn
0163-1829
dc.identifier.uri
http://hdl.handle.net/11336/34936
dc.description.abstract
Supersaturation etching starts with Cl insertion into Si-Si bonds of Si(100) and leads to the desorption of SiCl2 pairs. During etching, insertion occurs through a Cl2 dissociative chemisorption process mediated by single dangling bond sites created by phonon-activated electron-stimulated desorption of atomic Cl. Based on scanning tunneling microscopy results, we identify a surface species, describe its involvement in supersaturation etching, and explore the energetics that control this process. In doing so, we show that insertion occurs at room temperature and that paired dangling bonds of bare dimers also mediate this process.
dc.format
application/pdf
dc.language.iso
eng
dc.publisher
American Physical Society
dc.rights
info:eu-repo/semantics/restrictedAccess
dc.rights.uri
https://creativecommons.org/licenses/by-nc-sa/2.5/ar/
dc.subject
Dry Etching
dc.subject
Silicon
dc.subject
Clorine
dc.subject.classification
Astronomía
dc.subject.classification
Ciencias Físicas
dc.subject.classification
CIENCIAS NATURALES Y EXACTAS
dc.title
Atomic processes during Cl supersaturation etching of Si(100)-(2x1)
dc.type
info:eu-repo/semantics/article
dc.type
info:ar-repo/semantics/artículo
dc.type
info:eu-repo/semantics/publishedVersion
dc.date.updated
2018-01-25T19:52:54Z
dc.journal.volume
79
dc.journal.number
12
dc.journal.pagination
125303-125303
dc.journal.pais
Estados Unidos
dc.journal.ciudad
College Park
dc.description.fil
Fil: Aldao, Celso Manuel. University of Illinois at Urbana; Estados Unidos. Consejo Nacional de Investigaciones Científicas y Técnicas. Centro Científico Tecnológico Conicet - Mar del Plata. Instituto de Investigaciones en Ciencia y Tecnología de Materiales. Universidad Nacional de Mar del Plata. Facultad de Ingeniería. Instituto de Investigaciones en Ciencia y Tecnología de Materiales; Argentina
dc.description.fil
Fil: Agrawal, Abhishek. University of Illinois at Urbana; Estados Unidos
dc.description.fil
Fil: Butera, R. E.. University of Illinois at Urbana; Estados Unidos
dc.description.fil
Fil: Weaver, J. H.. University of Illinois at Urbana; Estados Unidos
dc.journal.title
Physical Review B
dc.relation.alternativeid
info:eu-repo/semantics/altIdentifier/doi/http://dx.doi.org/10.1103/PhysRevB.79.125303
dc.relation.alternativeid
info:eu-repo/semantics/altIdentifier/url/https://journals.aps.org/prb/abstract/10.1103/PhysRevB.79.125303


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