Artículo
Mixed-morphology and mixed-orientation block copolymer bilayers
García, Nicolás
; Davis, Raleigh L.; Kim, So Youn; Chaikin, Paul M.; Register, Richard A.; Vega, Daniel Alberto
Fecha de publicación:
08/2014
Editorial:
Royal Society of Chemistry
Revista:
RSC Advances
e-ISSN:
2046-2069
Idioma:
Inglés
Tipo de recurso:
Artículo publicado
Clasificación temática:
Resumen
Block copolymers have attracted considerable attention due to their ability to self-assemble into highly regular structures, spanning length scales from several nanometers to over 100 nm. Block copolymers confined in thin films have been extensively utilized as soft templates for nanofabrication, but most applications have been restricted to single-layer templates with smectic and hexagonal symmetries. Here we show that a multi-step approach that includes shear alignment, thin film lift-off, and stacking can access novel three-dimensional block copolymer structures with long-range order and mixed symmetries. This technique allows control over the long-range order and also expands the range of nanolithographic templates accessible through guided self-assembly.
Palabras clave:
Nanotechnology
,
Block Copolymer
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Articulos(IFISUR)
Articulos de INSTITUTO DE FISICA DEL SUR
Articulos de INSTITUTO DE FISICA DEL SUR
Citación
García, Nicolás; Davis, Raleigh L.; Kim, So Youn; Chaikin, Paul M.; Register, Richard A.; et al.; Mixed-morphology and mixed-orientation block copolymer bilayers; Royal Society of Chemistry; RSC Advances; 4; 472; 8-2014; 38412-38417
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