Artículo
High-quality in situ manganite thin films by pulsed laser deposition at low background pressures
Fecha de publicación:
06/2006
Editorial:
Springer
Revista:
European Physical Journal B - Condensed Matter
ISSN:
1434-6028
Idioma:
Inglés
Tipo de recurso:
Artículo publicado
Clasificación temática:
Resumen
We show that by decreasing the laser fluence it is possible to improve the oxidation process in manganite thin films under low background oxygen pressure, allowing the in situ use of conventional Reflection High Energy Electron Diffraction diagnostic. Films deposited at low fluence (corresponding to a deposition rate per pulse lower than 10−2 unit cells per laser shot) show a two-dimensional growth mode and possess very good transport properties without the necessity of any further post-growth annealing treatment. A physical model, based on the plume-background interaction as a primary mechanism of film oxidation during growth, is proposed to explain the experimental findings. and possess very good transport properties without the necessity of any further post-growth annealing treatment. A physical model, based on the plume-background interaction as a primary mechanism of film oxidation during growth, is proposed to explain the experimental findings. −2 unit cells per laser shot) show a two-dimensional growth mode and possess very good transport properties without the necessity of any further post-growth annealing treatment. A physical model, based on the plume-background interaction as a primary mechanism of film oxidation during growth, is proposed to explain the experimental findings.
Palabras clave:
Pressure
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Identificadores
Colecciones
Articulos(SEDE CENTRAL)
Articulos de SEDE CENTRAL
Articulos de SEDE CENTRAL
Citación
Tebano, A.; Balestrino, G.; Boggio, Norberto Gabriel; Aruta, C.; Davidson, B.; et al.; High-quality in situ manganite thin films by pulsed laser deposition at low background pressures; Springer; European Physical Journal B - Condensed Matter; 51; 3; 6-2006; 337-340
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