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dc.contributor.author
Dussan, A.  
dc.contributor.author
Koropecki, Roberto Roman  
dc.date.available
2017-08-17T21:35:36Z  
dc.date.issued
2007-12  
dc.identifier.citation
Dussan, A.; Koropecki, Roberto Roman; Effect of boron on the microstructure of hydrogenated microcrystalline silicon thin films; Wiley VCH Verlag; Physica Status Solidi (C); 4; 11; 12-2007; 4134-4138  
dc.identifier.issn
1610-1642  
dc.identifier.uri
http://hdl.handle.net/11336/22656  
dc.description.abstract
In this work, a series of boron doped microcrystalline silicon films (µc-Si:H (B)) were deposited by plasma-enhanced chemical vapor deposition (PECVD), using silane (SiH4) diluted in hydrogen, and diborane (B2H6) as a dopant gas. The concentration of B2H6 was varied in the range of 0–100 ppm. The microstructure and morphology of samples were analyzed by atomic force microscopy (AFM), X-ray diffraction (XRD), and Raman spectroscopy. A trend towards increasing crystalline volume fraction and grain size were observed as boron concentration in the samples increased; while the XRD spectra show that the peak intensity at 2? ˜ 47° decreases and becomes gradually amorphous with the increasing degree of doping. The doped microcrystalline silicon films presented a crystallographic preferential orientation in the plane (220). Correlations between structural and electric properties were also studied.  
dc.format
application/pdf  
dc.language.iso
eng  
dc.publisher
Wiley VCH Verlag  
dc.rights
info:eu-repo/semantics/openAccess  
dc.rights.uri
https://creativecommons.org/licenses/by-nc-sa/2.5/ar/  
dc.subject
Microcrystalline Silicon  
dc.subject
Boron Doping  
dc.subject.classification
Otras Ciencias Físicas  
dc.subject.classification
Ciencias Físicas  
dc.subject.classification
CIENCIAS NATURALES Y EXACTAS  
dc.title
Effect of boron on the microstructure of hydrogenated microcrystalline silicon thin films  
dc.type
info:eu-repo/semantics/article  
dc.type
info:ar-repo/semantics/artículo  
dc.type
info:eu-repo/semantics/publishedVersion  
dc.date.updated
2017-08-04T15:49:41Z  
dc.journal.volume
4  
dc.journal.number
11  
dc.journal.pagination
4134-4138  
dc.journal.pais
Alemania  
dc.journal.ciudad
Berlín  
dc.description.fil
Fil: Dussan, A.. Universidad Nacional de Colombia; Colombia  
dc.description.fil
Fil: Koropecki, Roberto Roman. Consejo Nacional de Investigaciones Científicas y Técnicas. Centro Científico Tecnológico Conicet - Santa Fe. Instituto de Desarrollo Tecnológico para la Industria Química. Universidad Nacional del Litoral. Instituto de Desarrollo Tecnológico para la Industria Química; Argentina  
dc.journal.title
Physica Status Solidi (C)  
dc.relation.alternativeid
info:eu-repo/semantics/altIdentifier/doi/http://dx.doi.org/10.1002/pssc.200675915  
dc.relation.alternativeid
info:eu-repo/semantics/altIdentifier/url/http://onlinelibrary.wiley.com/doi/10.1002/pssc.200675915/abstract