Artículo
High removal of chlorinated solvents by reusable polydimethylsiloxane based absorbents
Saleh Medina, Leila María
; Cánneva, Antonela; Molinari, Fabricio Nicolás; D'accorso, Norma Beatriz
; Negri, Ricardo Martin
Fecha de publicación:
11/2022
Editorial:
John Wiley & Sons
Revista:
Polymer Engineering and Science
ISSN:
0032-3888
Idioma:
Inglés
Tipo de recurso:
Artículo publicado
Clasificación temática:
Resumen
The objective of this work is to prepare absorbent materials based on polydimethylsiloxane (PDMS) for the absorption of organic solvents by a relative simple method, with large absorption capacities and reusability. Different particles (ZnO, MgSO4, ZnCl2, and NaHCO3) were first incorporated in PDMS and then removed by immersion in HCl (c) or water. The absorbent materials were characterized by TGA, mercury porosimetry, stress–strain curves, SEM, EDS, XPS, FTIR, and water contact angle. The materials can absorb polar organic chlorinated solvents (carbon tetrachloride, dichloroethene, dichloromethane, and chloroform) more than four times its own weight. Other solvents were also tested showing 2–3 times its own weight. Additionally, these materials show demulsification properties and absorption of oleophilic compounds. The reusability of the material makes them good candidates for remediation of polluted water.
Archivos asociados
Licencia
Identificadores
Colecciones
Articulos(CIHIDECAR)
Articulos de CENTRO DE INVESTIGACIONES EN HIDRATOS DE CARBONO
Articulos de CENTRO DE INVESTIGACIONES EN HIDRATOS DE CARBONO
Articulos(INQUIMAE)
Articulos de INST.D/QUIM FIS D/L MATERIALES MEDIOAMB Y ENERGIA
Articulos de INST.D/QUIM FIS D/L MATERIALES MEDIOAMB Y ENERGIA
Articulos(SEDE CENTRAL)
Articulos de SEDE CENTRAL
Articulos de SEDE CENTRAL
Citación
Saleh Medina, Leila María; Cánneva, Antonela; Molinari, Fabricio Nicolás; D'accorso, Norma Beatriz; Negri, Ricardo Martin; High removal of chlorinated solvents by reusable polydimethylsiloxane based absorbents; John Wiley & Sons; Polymer Engineering and Science; 63; 2; 11-2022; 366-378
Compartir
Altmétricas