Artículo
Influence of argon pressure on the structural properties of polycrystalline sputtered Fe0.89Ga0.11 thin films
Ramírez, G. A.; Moya Riffo, Alvaro Esteban
; Gómez, J. E.; Malamud, F.; Rodríguez, L. M.; Fregenal, Daniel Eduardo
; Bernardi, G.; Butera, Alejandro Ricardo
; Milano, Julian
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Fecha de publicación:
12/2020
Editorial:
Elsevier Science Inc.
Revista:
Materials Characterization
ISSN:
1044-5803
Idioma:
Inglés
Tipo de recurso:
Artículo publicado
Clasificación temática:
Resumen
In this work, we present a systematic study on the relation between the elastic behavior and the structural properties of polycrystalline Fe0.89Ga0.11 thin films deposited on Si(100) substrates. By carrying out pole figure (PF) measurements, we determined the evolution of the texture components, residual stress and Young's modulus (Ys) as a function of the Ar pressure. The samples display several fiber-like texture components (where the fiber axes is always along the growth direction) beside to a random component; the texture component weights depend on the Ar pressure. The study of the residual stress reveals that the samples present a tensile stress, that relaxes when the Ar pressure increases. In the case of Ys, the estimated values vary slightly within the Ar pressure range studied. Finally, the residual stress and Ys behavior is correlated with the microstructure evolution by using the orientation distribution function (ODF) simulated from the PFs.
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Articulos (UE-INN - NODO BARILOCHE)
Articulos de UNIDAD EJECUTORA INSTITUTO DE NANOCIENCIA Y NANOTECNOLOGIA - NODO BARILOCHE
Articulos de UNIDAD EJECUTORA INSTITUTO DE NANOCIENCIA Y NANOTECNOLOGIA - NODO BARILOCHE
Citación
Ramírez, G. A.; Moya Riffo, Alvaro Esteban; Gómez, J. E.; Malamud, F.; Rodríguez, L. M.; et al.; Influence of argon pressure on the structural properties of polycrystalline sputtered Fe0.89Ga0.11 thin films; Elsevier Science Inc.; Materials Characterization; 171; 12-2020; 1-9
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