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dc.contributor.author
Maldonado, David  
dc.contributor.author
Aguirre, Fernando Leonel  
dc.contributor.author
González Cordero, G.  
dc.contributor.author
Roldán, A. M.  
dc.contributor.author
González, M. B.  
dc.contributor.author
Jiménez Molinos, F.  
dc.contributor.author
Campabadal, F.  
dc.contributor.author
Miranda, E.  
dc.contributor.author
Roldán, J. B.  
dc.date.available
2022-03-17T20:06:53Z  
dc.date.issued
2021-08  
dc.identifier.citation
Maldonado, David; Aguirre, Fernando Leonel; González Cordero, G.; Roldán, A. M.; González, M. B.; et al.; Experimental study of the series resistance effect and its impact on the compact modeling of the conduction characteristics of HfO2-based resistive switching memories; American Institute of Physics; Journal of Applied Physics; 130; 5; 8-2021; 1-13  
dc.identifier.issn
0021-8979  
dc.identifier.uri
http://hdl.handle.net/11336/153533  
dc.description.abstract
The relevance of the intrinsic series resistance effect in the context of resistive random access memory (RRAM) compact modeling is investigated. This resistance notably affects the conduction characteristic of resistive switching memories so that it becomes an essential factor to consider when fitting experimental data, especially those coming from devices exhibiting the so-called snapback and snapforward effects. A thorough description of the resistance value extraction procedure and an analysis of the connection of this value with the set and reset transition voltages in HfO2-based valence change memories are presented. Furthermore, in order to illustrate the importance of this feature in the shape of the I–V curve, the Stanford model for RRAM devices is enhanced by incorporating the series resistance as an additional parameter in the Verilog-A model script.  
dc.format
application/pdf  
dc.language.iso
eng  
dc.publisher
American Institute of Physics  
dc.rights
info:eu-repo/semantics/restrictedAccess  
dc.rights.uri
https://creativecommons.org/licenses/by-nc-sa/2.5/ar/  
dc.subject
RRAM  
dc.subject
Verilog  
dc.subject.classification
Nano-materiales  
dc.subject.classification
Nanotecnología  
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INGENIERÍAS Y TECNOLOGÍAS  
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Nano-procesamiento  
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Nanotecnología  
dc.subject.classification
INGENIERÍAS Y TECNOLOGÍAS  
dc.title
Experimental study of the series resistance effect and its impact on the compact modeling of the conduction characteristics of HfO2-based resistive switching memories  
dc.type
info:eu-repo/semantics/article  
dc.type
info:ar-repo/semantics/artículo  
dc.type
info:eu-repo/semantics/publishedVersion  
dc.date.updated
2022-03-14T21:05:34Z  
dc.identifier.eissn
1089-7550  
dc.journal.volume
130  
dc.journal.number
5  
dc.journal.pagination
1-13  
dc.journal.pais
Estados Unidos  
dc.description.fil
Fil: Maldonado, David. Universidad de Granada; España  
dc.description.fil
Fil: Aguirre, Fernando Leonel. Universidad Tecnológica Nacional. Facultad Regional Buenos Aires. Unidad de Investigación y Desarrollo de las Ingenierías; Argentina. Universitat Autònoma de Barcelona; España. Consejo Nacional de Investigaciones Científicas y Técnicas; Argentina  
dc.description.fil
Fil: González Cordero, G.. Universidad de Granada; España  
dc.description.fil
Fil: Roldán, A. M.. Universidad de Granada; España  
dc.description.fil
Fil: González, M. B.. Instituto de Microelectronica de Barcelona; España. Consejo Superior de Investigaciones Científicas; España  
dc.description.fil
Fil: Jiménez Molinos, F.. Universidad de Granada; España  
dc.description.fil
Fil: Campabadal, F.. Instituto de Microelectronica de Barcelona; España. Consejo Superior de Investigaciones Científicas; España  
dc.description.fil
Fil: Miranda, E.. Universitat Autònoma de Barcelona; España  
dc.description.fil
Fil: Roldán, J. B.. Universidad de Granada; España  
dc.journal.title
Journal of Applied Physics  
dc.relation.alternativeid
info:eu-repo/semantics/altIdentifier/doi/https://aip.scitation.org/doi/10.1063/5.0055982  
dc.relation.alternativeid
info:eu-repo/semantics/altIdentifier/doi/http://dx.doi.org/10.1063/5.0055982