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dc.contributor.author
da Silva Costa, Daniel
dc.contributor.author
Kellermann, Guinther
dc.contributor.author
Craievich, Aldo Felix
dc.contributor.author
Giovanetti, Lisandro Jose
dc.contributor.author
Huck Iriart, Cristián
dc.contributor.author
Requejo, Felix Gregorio
dc.date.available
2021-07-30T19:23:25Z
dc.date.issued
2021-10
dc.identifier.citation
da Silva Costa, Daniel; Kellermann, Guinther; Craievich, Aldo Felix; Giovanetti, Lisandro Jose; Huck Iriart, Cristián; et al.; In situ study of the process of formation of hexagonal NiSi2 nanoplates and spherical Ni nanoparticles embedded in a Si(001) wafer covered by a Ni-doped SiO2 thin film; Elsevier Science SA; Journal of Alloys and Compounds; 879; 160345; 10-2021; 1-9
dc.identifier.issn
0925-8388
dc.identifier.uri
http://hdl.handle.net/11336/137505
dc.description.abstract
We have studied for the first time the relevant features of the thermally activated nanostructural transformations occurring in a material initially consisting of a flat Si(001) wafer in which a nanoporous Ni-doped silica film is deposited. Two simultaneous transformation processes occur, and both were investigated by in situ grazing-incidence small-angle X-ray scattering during isothermal annealing at 405 °C, namely the kinetics of formation of (i) oriented NiSi2 hexagonal nanoplates endotaxially buried in a Si(001) wafer, and (ii) a set of randomly oriented spherical Ni nanocrystals with a two-mode radius distribution embedded in a Ni-doped silica thin film deposited on the Si wafer and in an intermediate layer between SiO2 film and the layer in which NiSi2 nanoplates are embedded. The analyses of the successive 2D scattering patterns measured in situ during isothermal annealing led us to establish the time invariances of the average radii of the spherical Ni nanocrystals and the time dependence of their number, together with the time dependences of the maximum diameter, thickness, number and total volume of the hexagonal NiSi2 nanoplates buried in the Si wafer.
dc.format
application/pdf
dc.language.iso
eng
dc.publisher
Elsevier Science SA
dc.rights
info:eu-repo/semantics/restrictedAccess
dc.rights.uri
https://creativecommons.org/licenses/by-nc-sa/2.5/ar/
dc.subject
GISAXS
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HEXAGONAL NANOPLATES
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KINETIC OF GROWTH
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Física de los Materiales Condensados
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Ciencias Físicas
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CIENCIAS NATURALES Y EXACTAS
dc.title
In situ study of the process of formation of hexagonal NiSi2 nanoplates and spherical Ni nanoparticles embedded in a Si(001) wafer covered by a Ni-doped SiO2 thin film
dc.type
info:eu-repo/semantics/article
dc.type
info:ar-repo/semantics/artículo
dc.type
info:eu-repo/semantics/publishedVersion
dc.date.updated
2021-07-29T11:42:41Z
dc.journal.volume
879
dc.journal.number
160345
dc.journal.pagination
1-9
dc.journal.pais
Países Bajos
dc.journal.ciudad
Amsterdam
dc.description.fil
Fil: da Silva Costa, Daniel. Universidade Federal do Paraná; Brasil
dc.description.fil
Fil: Kellermann, Guinther. Universidade Federal do Paraná; Brasil
dc.description.fil
Fil: Craievich, Aldo Felix. Universidade de Sao Paulo; Brasil
dc.description.fil
Fil: Giovanetti, Lisandro Jose. Consejo Nacional de Investigaciones Científicas y Técnicas. Centro Científico Tecnológico Conicet - La Plata. Instituto de Investigaciones Fisicoquímicas Teóricas y Aplicadas. Universidad Nacional de La Plata. Facultad de Ciencias Exactas. Instituto de Investigaciones Fisicoquímicas Teóricas y Aplicadas; Argentina
dc.description.fil
Fil: Huck Iriart, Cristián. Universidad Nacional de San Martín; Argentina
dc.description.fil
Fil: Requejo, Felix Gregorio. Consejo Nacional de Investigaciones Científicas y Técnicas. Centro Científico Tecnológico Conicet - La Plata. Instituto de Investigaciones Fisicoquímicas Teóricas y Aplicadas. Universidad Nacional de La Plata. Facultad de Ciencias Exactas. Instituto de Investigaciones Fisicoquímicas Teóricas y Aplicadas; Argentina
dc.journal.title
Journal of Alloys and Compounds
dc.relation.alternativeid
info:eu-repo/semantics/altIdentifier/url/https://www.sciencedirect.com/science/article/abs/pii/S0925838821017540
dc.relation.alternativeid
info:eu-repo/semantics/altIdentifier/doi/http://dx.doi.org/10.1016/j.jallcom.2021.160345
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