Artículo
Integrated Constraint Programming Scheduling Approach for Automated Wet-Etch Stations in Semiconductor Manufacturing
Fecha de publicación:
03/2011
Editorial:
American Chemical Society
Revista:
Industrial & Engineering Chemical Research
ISSN:
0888-5885
Idioma:
Inglés
Tipo de recurso:
Artículo publicado
Clasificación temática:
Resumen
This article addresses a challenging resource constrained flow shop scheduling problem from automated wetetch stations (AWSs) in wafer fabrication of semiconductor manufacturing facilities by means of a constraint programming (CP) methodology. Wet etching in wafer fabrication is a difficult process considering the material handling limitations and mixed intermediate policies. The proposed integrated approach consists of both a CP model and an efficient search strategy in order to handle the different features of the process. The domainspecific search strategy significantly improves the computational performance, a key aspect given the high combinatorial complexity of the problem. The search strategy objective is to avoid losing time due to early bad choices in the exploration and to produce good quality solutions with low computational effort. The applicability of the proposed integrated CP methodology is successfully tested with several examples taken from the literature, featuring a different number of jobs and baths.
Palabras clave:
Scheduling
,
Constraint Programming
,
Wet-Etch Station
Archivos asociados
Licencia
Identificadores
Colecciones
Articulos(INTEC)
Articulos de INST.DE DES.TECNOL.PARA LA IND.QUIMICA (I)
Articulos de INST.DE DES.TECNOL.PARA LA IND.QUIMICA (I)
Citación
Zeballos, Luis Javier; Castro, Pedro; Mendez, Carlos Alberto; Integrated Constraint Programming Scheduling Approach for Automated Wet-Etch Stations in Semiconductor Manufacturing; American Chemical Society; Industrial & Engineering Chemical Research; 50; 3; 3-2011; 1705-1715
Compartir
Altmétricas