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dc.contributor.author
Hofer, Juan Andres  
dc.contributor.author
Haberkorn, Nestor Fabian  
dc.date.available
2021-01-27T12:15:29Z  
dc.date.issued
2019-06  
dc.identifier.citation
Hofer, Juan Andres; Haberkorn, Nestor Fabian; Superconductivity in nanocrystalline tungsten thin films growth by sputtering in a nitrogen-argon mixture; Elsevier Science SA; Thin Solid Films; 685; 6-2019; 117-122  
dc.identifier.issn
0040-6090  
dc.identifier.uri
http://hdl.handle.net/11336/123855  
dc.description.abstract
We report on the structural and superconducting properties of nanocrystalline tungsten thin films growth by sputtering at room temperature with an N2:Ar mixture (N2 from 3% to 50%). The crystalline phases were identified by comparing as-grown and thermal annealed thin films. For N2/(Ar + N2) mixtures between 3 and 10%, the films display nanocrystalline β-W phase. Coexistence of β-W and W2N phases are observed for gas mixtures with N2 between 20% and 40%. A detailed study of the superconducting properties as function of the thickness was performed for W films growth with 8% N2 mixtures. For this concentration, the nitrogen atoms increase the disorder at the nanoscale reducing the grain size and avoiding the crystallization of α-W. The superconducting critical temperature (Tc = 4.7 K) is thickness independent for films thicker than ~17 nm. Below this thickness, the Tc value decreases systematically being 3.1 K for 4 nm thick films. Our study provides a simple method for the fabrication of nanocrystalline β-W thin films with potential applications in superconducting devices.  
dc.format
application/pdf  
dc.language.iso
eng  
dc.publisher
Elsevier Science SA  
dc.rights
info:eu-repo/semantics/restrictedAccess  
dc.rights.uri
https://creativecommons.org/licenses/by-nc-sa/2.5/ar/  
dc.subject
SPUTTERING  
dc.subject
SUPERCONDUCTIVITY  
dc.subject
TUNGSTEN  
dc.subject.classification
Física de los Materiales Condensados  
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Ciencias Físicas  
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CIENCIAS NATURALES Y EXACTAS  
dc.title
Superconductivity in nanocrystalline tungsten thin films growth by sputtering in a nitrogen-argon mixture  
dc.type
info:eu-repo/semantics/article  
dc.type
info:ar-repo/semantics/artículo  
dc.type
info:eu-repo/semantics/publishedVersion  
dc.date.updated
2020-12-16T18:23:34Z  
dc.journal.volume
685  
dc.journal.pagination
117-122  
dc.journal.pais
Países Bajos  
dc.journal.ciudad
Amsterdam  
dc.description.fil
Fil: Hofer, Juan Andres. Comisión Nacional de Energía Atómica. Gerencia del Área de Energía Nuclear. Instituto Balseiro; Argentina. Consejo Nacional de Investigaciones Científicas y Técnicas; Argentina  
dc.description.fil
Fil: Haberkorn, Nestor Fabian. Consejo Nacional de Investigaciones Científicas y Técnicas. Oficina de Coordinación Administrativa Ciudad Universitaria. Unidad Ejecutora Instituto de Nanociencia y Nanotecnología. Unidad Ejecutora Instituto de Nanociencia y Nanotecnología - Nodo Bariloche | Comisión Nacional de Energía Atómica. Unidad Ejecutora Instituto de Nanociencia y Nanotecnología. Unidad Ejecutora Instituto de Nanociencia y Nanotecnología - Nodo Bariloche; Argentina  
dc.journal.title
Thin Solid Films  
dc.relation.alternativeid
info:eu-repo/semantics/altIdentifier/doi/https://doi.org/10.1016/j.tsf.2019.06.014  
dc.relation.alternativeid
info:eu-repo/semantics/altIdentifier/url/https://www.sciencedirect.com/science/article/abs/pii/S0040609019303839