Artículo
Surface growth by random deposition of rigid and wetting clusters
Fecha de publicación:
24/09/2015
Editorial:
Elsevier Science
Revista:
Surface Science
ISSN:
0039-6028
Idioma:
Inglés
Tipo de recurso:
Artículo publicado
Clasificación temática:
Resumen
Surface grown by the deposition of rigid and wetting clusters has been investigated using Monte Carlo simulations in 1 + 1 dimensions. Dynamic scaling exponents were determined using the time evolution of the roughness, the local width, the height-height correlation function, and the power spectrum. The values obtainedfor the roughness exponent clearly reflect the growth mechanism adopted for deposition. In the case of wettingclusters, the roughness exponent corresponds to that of random deposition, but a correlation appears for lowwindow size, with a crossover that is related to the average cluster size and cluster size distribution. On theother hand, rigid cluster deposition belongs to the KPZ universality class. However, determined scaling exponents converge very slowly to those corresponding to KPZ.
Palabras clave:
Surface Growth
,
Dynamic Scaling
,
Cluster Deposition
,
Monte Carlo Simulation
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Identificadores
Colecciones
Articulos(INTEMA)
Articulos de INST.DE INV.EN CIENCIA Y TECNOL.MATERIALES (I)
Articulos de INST.DE INV.EN CIENCIA Y TECNOL.MATERIALES (I)
Citación
Mirabella, D. A.; Aldao, Celso Manuel; Surface growth by random deposition of rigid and wetting clusters; Elsevier Science; Surface Science; 646; 24-9-2015; 282-287
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