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dc.contributor.author
Macchi, Carlos Eugenio
dc.contributor.author
Burgi, Juan Mauel
dc.contributor.author
García Molleja, Javier
dc.contributor.author
Mariazzi, Sebastiano
dc.contributor.author
Piccoli, Mattia
dc.contributor.author
Bemporad, Edoardo
dc.contributor.author
Feugeas, Jorge Nestor
dc.contributor.author
Sennen Brusa, Roberto
dc.contributor.author
Somoza, Alberto Horacio
dc.date.available
2016-03-04T13:07:09Z
dc.date.issued
2014-08
dc.identifier.citation
Macchi, Carlos Eugenio; Burgi, Juan Mauel; García Molleja, Javier; Mariazzi, Sebastiano; Piccoli, Mattia; et al.; Depth profiling and morphological characterization of AlN thin films deposited on Si substrates using a reactive sputter magnetron; EDP Sciences; European Physical Journal Applied Physics; 67; 2; 8-2014; 21301-21301
dc.identifier.issn
1951-6355
dc.identifier.uri
http://hdl.handle.net/11336/4605
dc.description.abstract
It is well-known that the characteristics of aluminum nitride thin films mainly depend on their morphologies, the quality of the film-substrate interfaces and the open volume defects. A study of the depth profiling and morphological characterization of AlN thin films deposited on two types of Si substrates is presented. Thin films of thicknesses between 200 and 400 nm were deposited during two deposition times using a reactive sputter magnetron. These films were characterized by means of X-ray diffraction and imaging techniques (SEM and TEM). To analyze the composition of the films, energy dispersive X-ray spectroscopy was applied. Positron annihilation spectroscopy, specifically Doppler broadening spectroscopy, was used to gather information on the depth profiling of open volume defects inside the films and the AlN films-Si substrate interfaces. The results are interpreted in terms of the structural changes induced in the films as a consequence of changes in the deposition time (i.e., thicknesses) and of the orientation of the substrates.
dc.format
application/pdf
dc.language.iso
eng
dc.publisher
EDP Sciences
dc.rights
info:eu-repo/semantics/openAccess
dc.rights.uri
https://creativecommons.org/licenses/by-nc-sa/2.5/ar/
dc.subject
Aluminum Nitride
dc.subject
Films
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Reactive Sputter Magnetron
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Positron Annihilation
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Física de los Materiales Condensados
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Ciencias Físicas
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CIENCIAS NATURALES Y EXACTAS
dc.title
Depth profiling and morphological characterization of AlN thin films deposited on Si substrates using a reactive sputter magnetron
dc.type
info:eu-repo/semantics/article
dc.type
info:ar-repo/semantics/artículo
dc.type
info:eu-repo/semantics/publishedVersion
dc.date.updated
2016-03-30 10:35:44.97925-03
dc.journal.volume
67
dc.journal.number
2
dc.journal.pagination
21301-21301
dc.journal.pais
Francia
dc.journal.ciudad
Paris
dc.description.fil
Fil: Macchi, Carlos Eugenio. Universidad Nacional del Centro de la Provincia de Buenos Aires. Facultad de Ciencias Exactas. Instituto de Física de Materiales; Argentina
dc.description.fil
Fil: Burgi, Juan Mauel. Consejo Nacional de Investigaciones Científicas y Técnicas. Centro Científico Tecnológico Rosario. Instituto de Física de Rosario (i); Argentina
dc.description.fil
Fil: García Molleja, Javier. Consejo Nacional de Investigaciones Científicas y Técnicas. Centro Científico Tecnológico Rosario. Instituto de Física de Rosario (i); Argentina
dc.description.fil
Fil: Mariazzi, Sebastiano. Universitá di Trento. Dipartimento di Fisica; Italia
dc.description.fil
Fil: Piccoli, Mattia. Universitá di Roma Tre. Dipartimento di Ingegneria Meccanica ed Industriale; Italia
dc.description.fil
Fil: Bemporad, Edoardo. Universitá di Roma Tre. Dipartimento di Ingegneria Meccanica ed Industriale; Italia
dc.description.fil
Fil: Feugeas, Jorge Nestor. Consejo Nacional de Investigaciones Científicas y Técnicas. Centro Científico Tecnológico Rosario. Instituto de Física de Rosario (i); Argentina
dc.description.fil
Fil: Sennen Brusa, Roberto. Universitá di Trento. Dipartimento di Fisica; Italia
dc.description.fil
Fil: Somoza, Alberto Horacio. Universidad Nacional del Centro de la Provincia de Buenos Aires. Facultad de Ciencias Exactas. Instituto de Física de Materiales; Argentina. Provincia de Buenos Aires. Gobernación. Comisión de Investigaciones Científicas; Argentina
dc.journal.title
European Physical Journal Applied Physics
dc.relation.alternativeid
info:eu-repo/semantics/altIdentifier/url/http://journals.cambridge.org/action/displayAbstract?fromPage=online&aid=9314113&fileId=S1286004214501917
dc.relation.alternativeid
info:eu-repo/semantics/altIdentifier/doi/http://dx.doi.org/10.1051/epjap/2014140191
dc.relation.alternativeid
info:eu-repo/semantics/altIdentifier/issn/1951-6355
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