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dc.contributor.author
Corso, Domenico  
dc.contributor.author
Libertino, Sebania  
dc.contributor.author
Lisiansky, Michael  
dc.contributor.author
Roizin, Yakov  
dc.contributor.author
Palumbo, Félix Roberto Mario  
dc.contributor.author
Principato, Fabio  
dc.contributor.author
Pace, Calogero  
dc.contributor.author
Finocchiaro, Paolo  
dc.contributor.author
Lombardo, Salvatore A.  
dc.date.available
2023-05-18T13:57:02Z  
dc.date.issued
2012-10  
dc.identifier.citation
Corso, Domenico; Libertino, Sebania; Lisiansky, Michael; Roizin, Yakov; Palumbo, Félix Roberto Mario; et al.; Threshold voltage variability of NROM memories after exposure to ionizing radiation; Institute of Electrical and Electronics Engineers; Ieee Transactions On Electron Devices; 59; 10; 10-2012; 2597-2602  
dc.identifier.issn
0018-9383  
dc.identifier.uri
http://hdl.handle.net/11336/198022  
dc.description.abstract
Threshold voltage (Vth) behavior of nitride read-only memories (NROMs) was studied after irradiation with photons (γ- and X-rays), light and heavy ions. Both programmed and nonprogrammed single cells were investigated. The data suggest that two main physical phenomena are contributing to Vth variation and that the Vth loss and the variability can be modeled by a Weibull statistics with a shape parameter k∼2.2 regardless of the irradiation species and total dose. The same peculiarities were found in large memory arrays, confirming the results from single-cell studies but with significantly larger statistics. Hence, once the irradiation dose is known, the Vth loss distribution can be obtained, thus providing a predictive model of the radiation tolerance of NROM memory arrays.  
dc.format
application/pdf  
dc.language.iso
eng  
dc.publisher
Institute of Electrical and Electronics Engineers  
dc.rights
info:eu-repo/semantics/openAccess  
dc.rights.uri
https://creativecommons.org/licenses/by-nc-sa/2.5/ar/  
dc.subject
FLASH MEMORIES  
dc.subject
NITRIDE READ-ONLY MEMORIES (NROMS)  
dc.subject
OXIDE-NITRIDE-OXIDE (ONO)  
dc.subject
RADIATION HARDNESS  
dc.subject.classification
Ingeniería Eléctrica y Electrónica  
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Ingeniería Eléctrica, Ingeniería Electrónica e Ingeniería de la Información  
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INGENIERÍAS Y TECNOLOGÍAS  
dc.title
Threshold voltage variability of NROM memories after exposure to ionizing radiation  
dc.type
info:eu-repo/semantics/article  
dc.type
info:ar-repo/semantics/artículo  
dc.type
info:eu-repo/semantics/publishedVersion  
dc.date.updated
2023-05-16T14:21:56Z  
dc.journal.volume
59  
dc.journal.number
10  
dc.journal.pagination
2597-2602  
dc.journal.pais
Estados Unidos  
dc.journal.ciudad
New York  
dc.description.fil
Fil: Corso, Domenico. Consiglio Nazionale delle Ricerche; Italia  
dc.description.fil
Fil: Libertino, Sebania. Consiglio Nazionale delle Ricerche; Italia  
dc.description.fil
Fil: Lisiansky, Michael. No especifíca;  
dc.description.fil
Fil: Roizin, Yakov. No especifíca;  
dc.description.fil
Fil: Palumbo, Félix Roberto Mario. Comisión Nacional de Energía Atómica; Argentina. Consejo Nacional de Investigaciones Científicas y Técnicas; Argentina  
dc.description.fil
Fil: Principato, Fabio. Università degli Studi di Palermo; Italia  
dc.description.fil
Fil: Pace, Calogero. Università della Calabria; Italia  
dc.description.fil
Fil: Finocchiaro, Paolo. No especifíca;  
dc.description.fil
Fil: Lombardo, Salvatore A.. Consiglio Nazionale delle Ricerche; Italia  
dc.journal.title
Ieee Transactions On Electron Devices  
dc.relation.alternativeid
info:eu-repo/semantics/altIdentifier/url/https://ieeexplore.ieee.org/abstract/document/6287009  
dc.relation.alternativeid
info:eu-repo/semantics/altIdentifier/doi/http://dx.doi.org/10.1109/TED.2012.2206596